Electron Gun, Electron Beam Applicator, and Method for Controlling Electron Gun

    公开(公告)号:US20230131413A1

    公开(公告)日:2023-04-27

    申请号:US17044850

    申请日:2020-05-08

    Abstract: The present disclosure addresses the problem of providing an electron gun that can directly monitor an intensity of an electron beam emitted from a photocathode using only the configuration provided to the electron gun, an electron beam applicator equipped with an electron gun, and a method for controlling an electron gun.
    The aforementioned problem can be solved by an electron gun comprising a light source, a photocathode that emits an electron beam in response to receiving light from the light source, an anode, an electron-beam-shielding member with which it is possible to shield part of the electron beam, and a measurement unit that measures the intensity of the electron beam emitted from the photocathode using a measurement electron beam shielded by the electron-beam-shielding member.

    PHOTOCATHODE KIT, ELECTRON GUN, AND ELECTRON BEAM APPLICATION DEVICE

    公开(公告)号:US20220181111A1

    公开(公告)日:2022-06-09

    申请号:US17604368

    申请日:2020-07-31

    Abstract: Provided is a photocathode kit that does not require adjustment of the distance between a photocathode film and a lens focusing on the photocathode film when the photocathode and the lens are installed inside an electron gun. The photocathode kit includes: a photocathode including a substrate in which a photocathode film is formed on a first surface; a lens; and a holder that holds the substrate and the lens, and the holder has a retaining member that retains the photocathode film and the lens to be spaced apart by a predetermined distance, and a first communication path that communicates between inside of the holder and outside of the holder.

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