CELL ARCHITECTURE FOR A SEMICONDUCTOR DEVICE

    公开(公告)号:US20230022681A1

    公开(公告)日:2023-01-26

    申请号:US17383208

    申请日:2021-07-22

    Abstract: In a first aspect, a semiconductor device includes a plurality of cells. Each cell of the plurality of cells includes four metal tracks running substantially parallel to each other in a first metal layer to provide signal routing and a plurality of wrapped channels having a pitch that is uniform among the plurality of wrapped channels. In a second aspect, a semiconductor device includes a plurality of cells. Each cell of the plurality of cells includes four metal tracks running substantially parallel to each other in a first metal layer to provide signal routing and a plurality of wrapped channels having an asymmetric distribution. For example, a first distance between a first pair of adjacent wrapped channels is different than a second distance between a second pair of adjacent wrapped channels.

    HIGH-VOLTAGE TOLERANT LEVEL SHIFTER USING THIN-OXIDE TRANSISTORS AND A MIDDLE-OF-THE-LINE (MOL) CAPACITOR

    公开(公告)号:US20190058477A1

    公开(公告)日:2019-02-21

    申请号:US15680643

    申请日:2017-08-18

    Abstract: A level shifter according to some embodiments is disclosed. In some embodiments, a level shifter includes a middle-of-the-line (MOL) capacitor; and a circuit including at least one thin-film transistor coupled to the MOL capacitor, wherein an input voltage provided to the MOL capacitor is split between the MOL capacitor and the circuit. The MOL capacitor can be formed with a contact strip adjacent to a gate structure. A method of forming a level shifter using thin-oxide technologies includes forming a middle-of-the-line (MOL) capacitor; forming a circuit with one or more thin-film transistors; and coupling the MOL capacitor to the circuit such that an input voltage provided at the MOL capacitor is split between the MOL capacitor and the circuit.

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