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公开(公告)号：US3843420A
公开(公告)日：1974-10-22
申请号：US29977072
申请日：1972-10-24
Applicant: RCA CORP
Inventor： GITTLEMAN J , HANAK J
CPC classification number: C23C14/3414 , C23C14/08 , H01F10/14
Abstract: 1. A SPUTTERED GRANULAR FERROMAGNETIC FILM CONSISTING ESSENTIALLY OF A COMPOSITION HAVING THE FORMULA
(FEYNI1-Y)1-X''SIO2)X
WHEREIN X IS FROM 0.001 TO 0.7 PART BY VOLUME AND Y IS FROM 0.001 TO 0.999 PART BY VOLUME, AND FURTHER CHARACTERIZED BY HAVING GRANULAR PARTICLE SIZE ON THE ORDER OF 10 TO 200 ANGSTROMS.-
公开(公告)号：US3803438A
公开(公告)日：1974-04-09
申请号：US35253873
申请日：1973-04-19
Applicant: RCA CORP
Inventor： HANAK J
CPC classification number: H05B33/14 , C09K11/584 , C23C14/0629 , C23C14/3407
Abstract: Radio frequency sputtered films of zinc sulfide containing about 0.2 - 0.4 mol percent of copper and 0.05 - 0.8 mol percent of manganese are electroluminescent. Cells thereof have high brightness and high power efficiency.
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3.发明授权Sputter-etching technique for recording holograms or other fine-detail relief patterns in hard durable materials 失效用于记录硬质材料或其他硬质材料中的细小图案的防溅蚀技术
公开(公告)号：US3733258A
公开(公告)日：1973-05-15
申请号：US3733258D
申请日：1971-02-03
Applicant: RCA CORP
CPC classification number: C23C14/35 , G03H1/02 , G03H1/0244 , G03H2001/0292 , G03H2270/52
Abstract: SPUTTER ETCHING HAS BEEN FOUND TO BE CAPABLE OF TRANSFERRING HOLOGRAMS RECORDED ON A PHOTOSENSITIVE SURFACE LAYER COVERING AN UNDERLYING SUBSTRATE MATERIAL FROM THE LAYER TO THE SUBSTRATE MATERIAL ITSELF. THE TRANSFERRED HOLOGRAM IS IN THE FORM OF A RELIEF PATTERN. THIS TECHNIQUE PROVIDES BOTH HIGH FIDELITY AND HIGH RESOLUTION CAPABILITIES IN BOTH THE DEPTH DIMENSION AND IN THE SURFACE DIMENSIONS OF THE TRANSFERRED RELIEF-PATTERN HOLOGRAM, WHICH ARE IN THE ORDER OF ONE MICRON OR LESS, AND IS APPLICABLE TO OTHER FINE-DETAIL RELIEF PATTERNS.
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