公开(公告)号：US20070080307A1

公开(公告)日：2007-04-12

申请号：US11539342

申请日：2006-10-06

申请人： RENE BRUIJN ,  Chinh Duc Tran ,  Bjoern Mader ,  Jesko Brudermann ,  Juergen Kleinschmidt

发明人： RENE BRUIJN ,  Chinh Duc Tran ,  Bjoern Mader ,  Jesko Brudermann ,  Juergen Kleinschmidt

IPC分类号： G01J3/10

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70991 ,  G21K1/10 ,  H05G2/001

摘要： The invention is directed to an arrangement for the suppression of unwanted spectral components (‘out-of-band’ radiation, as it is called) in a plasma-based radiation source. The object of the invention is to find a novel possibility for the suppression of unwanted spectral components in radiation exiting from a plasma-based EUV radiation source which permits a simple suppression of out-of-band radiation outside the desired EUV range without requiring costly manufacturing and adjustment of diffraction gratings. This object is met according to the invention in that a filter unit is provided between the plasma and an application location of the EUV radiation, which filter unit has at least one gas curtain comprising at least one rapidly flowing gas whose molecules have no absorption maxima for the desired EUV radiation and intensive absorption maxima for other, unwanted wavelengths that are emitted, at least in the IR region. For the purpose of generating the gas curtain, at least one slit nozzle and an efficient gas sink are arranged laterally opposite one another with respect to an optical axis of the beam bundle in order to limit the gas curtain in a spatially defined manner and to remove it again from the vacuum chambers as completely as possible.

摘要翻译： 本发明涉及一种用于在基于等离子体的辐射源中抑制不想要的光谱分量（如所谓的“带外”辐射）的布置。 本发明的目的是找到一种新颖的可能性，用于抑制从基于等离子体的EUV辐射源射出的辐射中的不需要的光谱分量，其允许在期望的EUV范围之外简单地抑制带外辐射，而不需要昂贵的制造 和衍射光栅的调整。 根据本发明满足本发明的目的在于，在等离子体和EUV辐射的施加位置之间提供过滤器单元，该过滤器单元具有至少一个气幕，其包括至少一个快速流动的气体，其分子对于 至少在IR区域发射的其他不需要的波长的期望的EUV辐射和强吸收最大值。 为了产生气幕，至少有一个狭缝喷嘴和有效的气体槽相对于束束的光轴横向相对布置，以便以空间限定的方式限制气幕并且移除 再次从真空室中尽可能完全地完成。

公开(公告)号：US07755070B2

公开(公告)日：2010-07-13

申请号：US11539342

申请日：2006-10-06

申请人： René De Bruijn ,  Chinh Duc Tran ,  Bjoern Mader ,  Jesko Brudermann ,  Juergen Kleinschmidt

发明人： René De Bruijn ,  Chinh Duc Tran ,  Bjoern Mader ,  Jesko Brudermann ,  Juergen Kleinschmidt

IPC分类号： H01L21/027 ,  G21K3/00 ,  G03F7/20

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70991 ,  G21K1/10 ,  H05G2/001

摘要： The invention is directed to an arrangement for the suppression of unwanted spectral components (‘out-of-band’ radiation, as it is called) in a plasma-based radiation source. The object of the invention is to find a novel possibility for the suppression of unwanted spectral components in radiation exiting from a plasma-based EUV radiation source which permits a simple suppression of out-of-band radiation outside the desired EUV range without requiring costly manufacturing and adjustment of diffraction gratings. This object is met according to the invention in that a filter unit is provided between the plasma and an application location of the EUV radiation, which filter unit has at least one gas curtain comprising at least one rapidly flowing gas whose molecules have no absorption maxima for the desired EUV radiation and intensive absorption maxima for other, unwanted wavelengths that are emitted, at least in the IR region. For the purpose of generating the gas curtain, at least one slit nozzle and an efficient gas sink are arranged laterally opposite one another with respect to an optical axis of the beam bundle in order to limit the gas curtain in a spatially defined manner and to remove it again from the vacuum chambers as completely as possible.

摘要翻译： 本发明涉及一种用于在基于等离子体的辐射源中抑制不想要的光谱分量（如所谓的“带外”辐射）的布置。 本发明的目的是找到一种新颖的可能性，用于抑制从基于等离子体的EUV辐射源射出的辐射中的不需要的光谱分量，其允许在期望的EUV范围之外简单地抑制带外辐射，而不需要昂贵的制造 和衍射光栅的调整。 根据本发明满足本发明的目的在于，在等离子体和EUV辐射的施加位置之间提供过滤器单元，该过滤器单元具有至少一个气幕，其包括至少一个快速流动的气体，其分子对于 至少在IR区域发射的其他不需要的波长的期望的EUV辐射和强吸收最大值。 为了产生气幕，至少有一个狭缝喷嘴和有效的气体槽相对于束束的光轴横向相对布置，以便以空间限定的方式限制气幕并且移除 再次从真空室中尽可能完全地完成。

公开(公告)号：US07750327B2

公开(公告)日：2010-07-06

申请号：US12120536

申请日：2008-05-14

申请人： Chinh Duc Tran ,  Jesko Brudermann ,  Bjoern Mader ,  Gilbert Dornieden ,  Thomas Brauner

发明人： Chinh Duc Tran ,  Jesko Brudermann ,  Bjoern Mader ,  Gilbert Dornieden ,  Thomas Brauner

IPC分类号： H04H1/04

CPC分类号： G03F7/70916 ,  G03F7/70908

摘要： The invention is directed to a device for generating flows of gas for filtering the radiation emitted in plasma-based radiation sources. It is the object of the invention to find a novel possibility for generating a gas curtain in the immediate vicinity of a radiating plasma so as to permit a simple arrangement and design and a long life of the device for generating the gas curtain under extreme thermal stress. According to the invention, this object is met in that a slit nozzle is formed of a plurality of partial bodies comprising different materials to form a supersonic nozzle profile for the generation of a broad gas curtain in order to accommodate the slit nozzle to different thermal and precision-mechanical requirements in the gas inlet region and in the gas outlet region.

摘要翻译： 本发明涉及用于产生用于过滤基于等离子体的辐射源中发射的辐射的气体流的装置。 本发明的目的是发现在靠近辐射等离子体处产生气幕的新颖可能性，以便在极端热应力下产生气幕的装置的简单布置和设计以及使用寿命长 。 根据本发明，该目的在于，狭缝喷嘴由包括不同材料的多个部分主体形成，以形成用于产生宽气帘的超音速喷嘴轮廓，以便将狭缝喷嘴适应于不同的热和 气体入口区域和气体出口区域的精密机械要求。