公开(公告)号：US20170096516A1

公开(公告)日：2017-04-06

申请号：US15128162

申请日：2015-03-16

Applicant: RHODIA OPERATIONS

Inventor： Simon HARRISSON ,  James WILSON

IPC: C08F293/00

CPC classification number: C08F293/005 ,  C08F2/22 ,  C08F2/26 ,  C08F2/38 ,  C08F220/56 ,  C08F293/00 ,  C08F2220/1825 ,  C08F2220/1808 ,  C08F2220/1841

Abstract: The present invention relates to a process for preparing a polymer with a mass Mw of less than 300 000 g/mol (especially between 1000 and 300 000 g/mol), comprising a step (E) of controlled radical polymerization in which the following are placed in contact in an aqueous medium in which are dispersed surfactant micelles: ethylenically unsaturated hydrophilic monomers predominantly present in the aqueous medium; partially water-soluble ethylenically unsaturated hydrophobic monomers different from the preceding monomers, at least partly present in the surfactant micelles, and having a solubility in the aqueous medium at least equal to that of hexyl acrylate; at least one radical polymerization initiator; and at least one radical polymerization control agent.

公开(公告)号：US20200048391A1

公开(公告)日：2020-02-13

申请号：US16655475

申请日：2019-10-17

Applicant: RHODIA OPERATIONS

Inventor： Simon HARRISSON ,  James WILSON

IPC: C08F293/00 ,  C08F2/26 ,  C08F2/38 ,  C08F220/56 ,  C08F2/22

Abstract: The present invention relates to a process for preparing a polymer with a mass Mw of less than 300 000 g/mol (especially between 1000 and 300 000 g/mol), comprising a step (E) of controlled radical polymerization in which the following are placed in contact in an aqueous medium in which are dispersed surfactant micelles: ethylenically unsaturated hydrophilic monomers predominantly present in the aqueous medium; partially water-soluble ethylenically unsaturated hydrophobic monomers different from the preceding monomers, at least partly present in the surfactant micelles, and having a solubility in the aqueous medium at least equal to that of hexyl acrylate; at least one radical polymerization initiator; and at least one radical polymerization control agent.