公开(公告)号：US4806192A

公开(公告)日：1989-02-21

申请号：US155542

申请日：1988-02-12

Applicant: Rainer D. Haas

Inventor： Rainer D. Haas

IPC: C23F1/08 ,  C23F1/16 ,  H05K3/06 ,  C23F1/02

CPC classification number: H05K3/067 ,  C23F1/08 ,  C23F1/16

Abstract: An apparatus for etching supports that have deposited thereon an etchable metal with an etching medium, which apparatus includes an etching chamber, means to convey the supports with metal deposited thereon through the etching chamber, a plurality of nozzles which are positioned to spray etching medium containing acid on the supports as they move through the etching chamber, a sump for receiving residual etching medium withdrawn from the etching chamber, a first circulating system for circulating residual etching medium from the sump back to the plurality of nozzles, a reservoir for an oxidizing agent, a device for regulating the addition of oxidizing agent into the circulating system in an amount which is stoichiometrically in excess of that required to remove metal from the supports, a chamber containing a metal which will react with the oxidizing agent, a second circulating system for circulating residual etching medium from the sump through the chamber containing a metal, a regenerating chamber to receive and regenerate the etching medium leaving the chamber containing a metal, and means to convey the etching medium regenerated in the regenerating chamber back to the sump.

Abstract translation: 一种用于蚀刻其上具有蚀刻介质的可蚀刻金属的载体的装置，该装置包括蚀刻室，用于通过蚀刻室输送其上沉积有金属的载体的装置，多个喷嘴，其被定位成喷射含有 在支撑体上移动通过蚀刻室时的酸，用于接收从蚀刻室取出的残留蚀刻介质的贮槽，用于将残留的蚀刻介质从贮槽循环回到多个喷嘴的第一循环系统，用于氧化剂的储存器 ，用于调节氧化剂添加到循环系统中的装置，其量以化学计量超过从载体除去金属所需的量，包含将与氧化剂反应的金属的室，第二循环系统，用于 循环剩余蚀刻介质从贮槽通过包含金属的再生室 以接收和再生离开包含金属的室的蚀刻介质，以及将在再生室中再生的蚀刻介质传送回到贮槽的装置。

公开(公告)号：US4772365A

公开(公告)日：1988-09-20

申请号：US929419

申请日：1986-11-12

Applicant: Rainer D. Haas

Inventor： Rainer D. Haas

IPC: C23F1/08 ,  C23F1/16 ,  H05K3/06 ,  C25F3/02 ,  C25F5/00 ,  C25F7/02

CPC classification number: H05K3/067 ,  C23F1/08 ,  C23F1/16

Abstract: In a method for etching material to be etched, which consists at least partly of metal, an acid is used, which attacks the metal solely after the addition of an oxidizing agent directly before the actual etching operation. The addition of the oxidizing agent takes place in a quantity which slightly exceeds the quantity stoichiometrically necessary for removing the entire metal, so that a small residue of oxidizing agent remains in the etching medium dropping from the material to be etched. This residual oxidizing agent is then removed from the etching medium by a special device, which contains an excess of metal able to be etched by the etching medium.

Abstract translation: 在用于蚀刻蚀刻材料的方法中，至少部分由金属构成，使用酸，其仅在直接在实际蚀刻操作之前添加氧化剂之后才对金属进行侵蚀。 氧化剂的添加量稍微超过去除整个金属所需的化学计量量，从而使蚀刻介质中的少量氧化剂残留在待蚀刻材料上。 然后通过专用装置从蚀刻介质中除去该残余氧化剂，该装置含有能够被蚀刻介质蚀刻的过量的金属。

公开(公告)号：US4741798A

公开(公告)日：1988-05-03

申请号：US929420

申请日：1986-11-12

Applicant: Rainer D. Haas

Inventor： Rainer D. Haas

IPC: C23F1/08 ,  H05K3/06 ,  H01L21/306 ,  C23F1/02

CPC classification number: C23F1/08 ,  H05K3/068

Abstract: In an installation for etching material to be etched consisting at least partly of metal, preferably copper, oxidizing agent is added to the etching medium containing an acid, directly before the actual etching operation, in a quantity which is in a ratio to the quantity required according to stoichiometric calculation for etching the quantity of metal to be removed respectively from the material to be etched. For this a device is provided which emits a first electrical signal. This gives information about the quantity of material to be removed from the material to be etched respectively being processed. A second signal is emitted by a detector when the material to be etched enters the actual etching machine. Both signals are processed by a central control unit. This takes place in such a way that the central control unit emits a third signal which it has ascertained according to a memorized program from the first signal and whenever the detector signal is received. The third signal corresponds to the respectively desired quantity of oxidizing agent and acts on a metering device which then undertakes measuring of the quantity of oxidizing agent. In the same way acid may be added to the etching medium for regeneration in a stoichiometrically defined quantity.

Abstract translation: 在至少部分由金属（优选铜）蚀刻的待蚀刻材料的设备中，将氧化剂直接在实际蚀刻操作之前添加到含有酸的蚀刻介质中，其量与所需量的比例 根据化学计量计算，分别蚀刻要从要蚀刻的材料中去除的金属的量。 为此，提供发出第一电信号的装置。 这提供了有关待分解被处理材料被去除的材料数量的信息。 当待蚀刻的材料进入实际的蚀刻机时，由检测器发出第二信号。 两个信号由中央控制单元处理。 这以这样一种方式进行，使得中央控制单元根据来自第一信号的存储程序和每当接收到检测器信号发出已经确定的第三信号。 第三信号对应于所需量的氧化剂，并作用在计量装置上，然后进行氧化剂的量的测量。 以相同的方式，酸可以以化学计量限定的量添加到蚀刻介质中用于再生。