公开(公告)号：US20110086312A1

公开(公告)日：2011-04-14

申请号：US12576622

申请日：2009-10-09

申请人： Ralph R. Dammel ,  Srinivasan Chakrapani ,  Munirathna Padmanaban ,  Shinji Miyazaki ,  Edward W. Ng ,  Takanori Kudo ,  Alberto D. Dioses ,  Francis M. Houlihan

发明人： Ralph R. Dammel ,  Srinivasan Chakrapani ,  Munirathna Padmanaban ,  Shinji Miyazaki ,  Edward W. Ng ,  Takanori Kudo ,  Alberto D. Dioses ,  Francis M. Houlihan

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/091

摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent of structure (7), and optionally, a photoacid generator and/or an acid and/or a thermal acid generator, where structure (7) is wherein W is selected from (C1-C30) linear, branched or cyclic alkyl moiety, substituted or unsubstituted (C3-C40) alicyclic hydrocarbon moiety and substituted is or unsubstituted (C3-C40) cycloalkylalkylene moiety; R is selected from C1-C10 linear or branched alkylene and n≧2. The invention further relates to a process for using such a composition.

摘要翻译： 本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，结构式（7）的乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂，其中结构（7）其中W选自（C1 -C 30）直链，支链或环状的烷基部分，取代或未取代的（C 3 -C 40）脂环烃部分和取代的或未取代的（C 3 -C 40）环烷基亚烷基部分; R选自C1-C10直链或支链亚烷基，n≥2。 本发明还涉及使用这种组合物的方法。

公开(公告)号：US20100136477A1

公开(公告)日：2010-06-03

申请号：US12325627

申请日：2008-12-01

申请人： Edward W. Ng ,  Nelson M. Felix ,  Munirathna Padmanaban ,  Srinivasan Chakrapani

发明人： Edward W. Ng ,  Nelson M. Felix ,  Munirathna Padmanaban ,  Srinivasan Chakrapani

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/091

摘要： The present invention relates to a novel photosensitive composition comprising a) an organic polymer, b) a photobase generator of structure (1), and c) optionally a photoacid generator, (+A1−O2C)—B—(CO2−A2+)x  (1) where A1+ and A2+ are independently an onium cation, x is an integer greater than or equal to 1, and B is a nonfluorinated hydrocarbon moiety. The photosensitive composition may be used as a photoresist composition or be used as an alkali developable antireflective underlayer coating composition.

摘要翻译： 本发明涉及一种新颖的光敏组合物，其包含a）有机聚合物，b）结构（1）的光碱产生剂，和c）任选的光酸产生剂，（+ A1-O 2 C）-B-（CO 2 -A 2 +）x （1）其中A1 +和A2 +独立地是鎓阳离子，x是大于或等于1的整数，B是非氟化烃部分。 光敏组合物可以用作光致抗蚀剂组合物或用作碱显影性抗反射底层涂料组合物。