Semiconductor device
    1.
    发明授权

    公开(公告)号:US10396549B2

    公开(公告)日:2019-08-27

    申请号:US15918309

    申请日:2018-03-12

    IPC分类号: H02H9/00 H02H9/04 H01L27/02

    摘要: Provided is a semiconductor device making it possible to promote area reduction while maintaining ESD resistance. The semiconductor device includes a power wire, a ground wire and a protection circuit provided between the power wire and the ground wire so as to cope with electrostatic discharge. The protection circuit includes a first transistor, a first resistive element, a second transistor, a first capacitive element, a first inverter and a protection transistor. A gate width of the second transistor is narrower than a gate width of the first transistor.

    Semiconductor device
    2.
    发明授权

    公开(公告)号:US09948090B2

    公开(公告)日:2018-04-17

    申请号:US14865418

    申请日:2015-09-25

    IPC分类号: H02H9/00 H02H9/04 H01L27/02

    摘要: Provided is a semiconductor device making it possible to promote area reduction while maintaining ESD resistance. The semiconductor device includes a power wire, a ground wire and a protection circuit provided between the power wire and the ground wire so as to cope with electrostatic discharge. The protection circuit includes a first transistor, a first resistive element, a second transistor, a first capacitive element, a first inverter and a protection transistor. A gate width of the second transistor is narrower than a gate width of the first transistor.