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公开(公告)号:US20240337934A1
公开(公告)日:2024-10-10
申请号:US18291075
申请日:2021-12-22
申请人: Resonac Corporation
CPC分类号: G03F7/033 , G03F7/105 , G03F7/115 , H05K3/0082 , H05K3/287
摘要: The present disclosure relates to a photosensitive resin composition for a permanent resist, the photosensitive resin composition including: (A) an acid-modified vinyl group-containing resin; (B) a photopolymerization initiator; and (C) a photopolymerizable compound, in which the photopolymerizable compound includes a photopolymerizable compound having four or more ethylenically unsaturated groups and a photopolymerizable compound having three or fewer ethylenically unsaturated groups.