公开(公告)号：US20240336810A1

公开(公告)日：2024-10-10

申请号：US18294889

申请日：2022-08-03

Applicant: Resonac Corporation

Inventor： Yasushi KURATA ,  Tomohiro IWANO ,  Noriaki MURAKAMI ,  Makoto MIZUTANI ,  Shigeki KUBOTA ,  Taira ONUMA ,  Masahiro KANNO

IPC: C09G1/02 ,  B24B37/04 ,  H01L21/3105

CPC classification number: C09G1/02 ,  B24B37/044 ,  H01L21/31053

Abstract: A polishing liquid for CMP, containing: abrasive grains; an additive; and water, in which the abrasive grains include cerium-based particles, the additive includes (A1) a 4-pyrone-based compound represented by General Formula (1) below and (B) a compound having two or more nitrogen atoms to which a hydroxyalkyl group is bonded. A polishing liquid for CMP, containing: abrasive grains; an additive; and water, in which the abrasive grains include cerium-based particles, the additive includes (A2) picolinic acid and (B) a compound having two or more nitrogen atoms to which a hydroxyalkyl group is bonded.




[in the formula, X11, X12, and X13 are each independently a hydrogen atom or a monovalent substituent.]

公开(公告)号：US20240336809A1

公开(公告)日：2024-10-10

申请号：US18294859

申请日：2022-08-03

Applicant: Resonac Corporation

Inventor： Yasushi KURATA ,  Tomohiro IWANO ,  Taira ONUMA ,  Shigeki KUBOTA ,  Makoto MIZUTANI ,  Noriaki MURAKAMI ,  Masahiro KANNO

IPC: C09G1/02 ,  B24B37/04 ,  H01L21/3105

CPC classification number: C09G1/02 ,  B24B37/044 ,  H01L21/31053

Abstract: A polishing liquid for CMP, containing: abrasive grains; an additive; and water, in which the abrasive grains include cerium-based particles, the additive includes (A1) a 4-pyrone-based compound represented by General Formula (1) below and (B) a saturated monocarboxylic acid, and a pH is more than 4.0. A polishing liquid for CMP, containing: abrasive grains; an additive; and water, in which the abrasive grains include cerium-based particles, the additive includes (A2) picolinic acid and (B) a saturated monocarboxylic acid, and a pH is more than 4.0.






[in the formula, X11, X12, and X13 are each independently a hydrogen atom or a monovalent substituent.]