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1.发明授权Method and system of distortion compensation in a projection imaging expose system 有权投影成像曝光系统中失真补偿的方法和系统公开(公告)号：US06580494B1
公开(公告)日：2003-06-17
申请号：US10198383
申请日：2002-07-16
IPC分类号： G03B2752
CPC分类号： G03F9/7003 , G03F7/70258 , G03F9/00
摘要： A photolithography imaging system and method that performs the tasks of mask alignment, panel recognition, establishing position offsets and adjusting mask rotation for accurate overlay imaging of the mask onto the panel, and correctly adjusting image magnification or reduction to properly size each stepped image to the panel distortion. This invention applies more directly to substrate panels whose dimensional stability is found difficult to control, repeatedly. More specifically, it applies to panels whose X axis distortion factor varies greatly from its Y axis distortion factor and the average adjustment of the image magnification or reduction does not satisfy tight registration requirements. What is new is that the calculation of the magnification or reduction adjustment is based on the mask image dimensions.
摘要翻译： 一种光刻成像系统和方法，其执行掩模对准，面板识别，建立位置偏移和调整掩模旋转的任务，以将掩模精确地叠加到面板上，并且正确地调整图像放大率或缩小以将每个步进图像适当地调整为 面板扭曲。 本发明更直接地应用于其尺寸稳定性难以控制的衬底面板。 更具体地说，它适用于其X轴失真因子从其Y轴失真因子变化很大的面板，并且图像放大或缩小的平均调整不满足严格的配准要求。 什么是新的是放大或缩小调整的计算是基于掩模图像尺寸。
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公开(公告)号：US09263797B1
公开(公告)日：2016-02-16
申请号：US13205261
申请日：2011-08-08
申请人： Richard R. Hall , Peter M. Nichols
发明人： Richard R. Hall , Peter M. Nichols
摘要： A system comprises a base having a sensor support frame moveably mounted thereto such that the support frame is pivotal about at least two axes with respect to a pivot point. A sensor is coupled to the support frame. At least one actuator is provided for pivoting the support frame about the pivot point.
摘要翻译： 系统包括具有可移动地安装到其上的传感器支撑框架的底座，使得支撑框架围绕关于枢轴点的至少两个轴线枢转。 传感器耦合到支撑框架。 提供至少一个致动器用于绕支点枢转支撑框架。
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