Method and apparatus for measuring thin film, and thin film deposition system
    1.
    发明申请
    Method and apparatus for measuring thin film, and thin film deposition system 失效
    测量薄膜的方法和装置以及薄膜沉积系统

    公开(公告)号:US20010043668A1

    公开(公告)日:2001-11-22

    申请号:US09852111

    申请日:2001-05-09

    IPC分类号: G01B015/02

    CPC分类号: C23C14/545 G01B15/02

    摘要: The thin film deposition system for depositing a thin film on the surface of substrates disposed in a sealed thin film deposition furnace comprises a measuring unit at a site communicating with the thin film deposition furnace, the measuring unit comprising a thin film deposition sample substrate for allowing a thin film substance flowing in from the thin film deposition furnace to adhere while X-ray incidence and extraction windows being provided on the side walls of the measuring unit, wherein X-ray is irradiated on the thin film deposition sample substrate in the measuring unit through the X-ray incidence window by means of a thin film measuring unit provided at the outside of the thin film deposition furnace, and the X-ray reflected from the thin film deposition sample substrate is sensed through the X-ray extraction window.

    摘要翻译: 用于在设置在密封薄膜沉积炉中的基板的表面上沉积薄膜的薄膜沉积系统包括在与薄膜沉积炉连通的位置处的测量单元,测量单元包括薄膜沉积样品基板,用于允许 在测量单元的侧壁上设置X射线入射和提取窗口的同时从薄膜沉积炉流入的薄膜物质,其中在测量单元中的薄膜沉积样品基板上照射X射线 通过设置在薄膜沉积炉外部的薄膜测量单元通过X射线入射窗,并且通过X射线提取窗口感测从薄膜沉积样品基底反射的X射线。

    Apparatus for X-ray analysis and apparatus for supplying X-rays
    2.
    发明申请
    Apparatus for X-ray analysis and apparatus for supplying X-rays 有权
    用于X射线分析的装置和用于提供X射线的装置

    公开(公告)号:US20030007599A1

    公开(公告)日:2003-01-09

    申请号:US10188398

    申请日:2002-07-02

    IPC分类号: G01N023/223

    CPC分类号: G01N23/00

    摘要: Apparatus for X-ray analysis has a combination of a rotating target X-ray tube and a composite monochromator. The composite monochromator has a first and a second elliptic monochromators joined with each other side by side. Each of the elliptic monochromators has a first focal point at which an X-ray focal spot on a target of the X-ray tube is disposed. Each of the elliptic monochromators has a synthetic multilayered thin film whose d-spacing varies continuously along an elliptic-arc. The shortest distance between the X-ray focal spot and the composite monochromator is set to 40 to 100 mm. Under the shortest distance condition, the effective focal spot size on the target is set to 40 to 100 micrometers to obtain the maximum X-ray intensity on a sample to be analyzed.

    摘要翻译: 用于X射线分析的装置具有旋转靶X射线管和复合单色仪的组合。 复合单色仪具有彼此并排连接的第一和第二椭圆形单色器。 每个椭圆形单色器具有设置在X射线管的靶上的X射线焦斑的第一焦点。 每个椭圆单色仪具有合成的多层薄膜,其d-间距沿椭圆弧连续变化。 将X射线焦点与复合单色仪之间的最短距离设定为40〜100mm。 在最短距离条件下,目标上的有效焦斑尺寸设定为40〜100微米,以获得待分析样品上的最大X射线强度。