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    Personal digital server (PDS)
    4.
    发明授权
    Personal digital server (PDS) 有权

    公开(公告)号：US10484469B2

    公开(公告)日：2019-11-19

    申请号：US15607304

    申请日：2017-05-26

    申请人： James Hoffman ,  James Friskel

    发明人： James Hoffman ,  James Friskel

    IPC分类号： H04L29/08 ,  G06F21/62 ,  H04L29/06

    摘要： Personal Digital Server (“PDS”) is a unique computer application for the storage, updating, management and sharing of all types of digital media files, including audio, video, images and documents, irrespective of their format. PDS provides users with a single location to store and access, both locally and remotely, all of their digital media. It also provides the user total control of the overall management of these assets.

    Frequency Monitoring to Detect Plasma Process Abnormality
    5.
    发明申请
    Frequency Monitoring to Detect Plasma Process Abnormality 有权
    频率监测检测等离子体过程异常

    公开(公告)号：US20110241892A1

    公开(公告)日：2011-10-06

    申请号：US13042408

    申请日：2011-03-07

    申请人： Beom Soo Park ,  Soo Young Choi ,  John M. White ,  Hong Soon Kim ,  James Hoffman

    发明人： Beom Soo Park ,  Soo Young Choi ,  John M. White ,  Hong Soon Kim ,  James Hoffman

    IPC分类号： G08B21/00 ,  G01R13/14

    CPC分类号： H01J37/32174 ,  H01J37/32935 ,  H03H7/40

    摘要： Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are established as a function of the frequency of the power supply sampled after a new process step begins or after a sample control signal changes state. In a second aspect, a second pair of lower and upper limits are not adapted to the frequency of the power supply. Both aspects preferably are used together to detect different occurrences of abnormal conditions.

    摘要翻译： 通过检测可变频率RF电源的频率是否移动到建立的下限和上限之外，来检测RF供电的等离子体处理室内的异常情况。 在第一方面，根据在新处理步骤开始之后或在采样控制信号改变状态之后采样的电源的频率，建立第一对下限和上限。 在第二方面，第二对下限和上限不适合电源的频率。 两个方面优选一起用于检测异常状况的不同出现。

    FLEXIBLE PROCESS CONDITION MONITORING
    6.
    发明申请
    FLEXIBLE PROCESS CONDITION MONITORING 失效
    灵活程序监控

    公开(公告)号：US20110190921A1

    公开(公告)日：2011-08-04

    申请号：US13019838

    申请日：2011-02-02

    申请人： Hong Soon Kim ,  James Hoffman ,  Beom Soo Park

    发明人： Hong Soon Kim ,  James Hoffman ,  Beom Soo Park

    IPC分类号： G06F19/00

    CPC分类号： G06F19/00

    摘要： The present invention generally relates to a method for flexible process condition monitoring. In a process that utilizes RF power, the RF power may be applied at different levels during different points in the process. Software may be programmed to facilitate the monitoring of the different points in the process so that the acceptable deviation range of the RF power for each point in the process may be set to different values. For example, one phase of the process may permit a greater range of RF power deviation while a second phase may be much more particular and permit very little deviation. By programming software to permit each phase of the process to be uniquely monitored, a more precise RF process may be obtained.

    摘要翻译： 本发明一般涉及一种用于灵活处理状态监测的方法。 在利用RF功率的过程中，RF功率可以在该过程的不同点处以不同的电平施加。 可以对软件进行编程以促进对该过程中的不同点的监视，使得该过程中每个点的RF功率的可接受的偏差范围可以被设置为不同的值。 例如，该过程的一个阶段可以允许较大范围的RF功率偏差，而第二阶段可能更加特别，并允许非常小的偏差。 通过编程软件来允许对过程的每个阶段进行唯一的监控，可以获得更精确的RF过程。

    Data Compaction Techniques
    9.
    发明申请
    Data Compaction Techniques 审中-公开
    数据压缩技术

    公开(公告)号：US20100056133A1

    公开(公告)日：2010-03-04

    申请号：US12615056

    申请日：2009-11-09

    申请人： Praveen Dua ,  David Nakahira ,  James Hoffman ,  Fiona Cain

    发明人： Praveen Dua ,  David Nakahira ,  James Hoffman ,  Fiona Cain

    IPC分类号： H04W24/00

    CPC分类号： H03M7/30

    摘要： Many areas of technology need highly accurate data compression to provide small, multifunctional devices. For example, in the area of communication governed by the IEEE 802.11 standards, a wireless device could significantly improve its performance by using its calibration data. Moreover, because of the increased mobility of users, a wireless device should be able to operate in different regulatory domains. This flexibility requires access to significant amounts of data regarding such regulatory domains. Advantageously, piecewise linear abstraction and/or mapping can be used to significantly reduce the amount of stored data while ensuring accuracy in reproducing the total data at a later point in time.

    摘要翻译： 许多技术领域需要高精度的数据压缩来提供小型，多功能的设备。 例如，在由IEEE 802.11标准管理的通信领域中，无线设备可以通过使用其校准数据来显着改善其性能。 此外，由于用户的移动性增加，无线设备应该能够在不同的监管领域中运行。 这种灵活性需要访问大量有关此类监管领域的数据。 有利地，可以使用分段线性抽象和/或映射来显着减少存储数据的量，同时确保在稍后时间点再现总数据的准确性。

    Frequency Monitoring to Detect Plasma Process Abnormality
    10.
    发明申请
    Frequency Monitoring to Detect Plasma Process Abnormality 有权
    频率监测检测等离子体过程异常

    公开(公告)号：US20080074255A1

    公开(公告)日：2008-03-27

    申请号：US11682290

    申请日：2007-03-05

    申请人： Beom Soo Park ,  Soo Young Choi ,  John M. White ,  Hong Soon Kim ,  James Hoffman

    发明人： Beom Soo Park ,  Soo Young Choi ,  John M. White ,  Hong Soon Kim ,  James Hoffman

    IPC分类号： G08B21/00

    CPC分类号： H01J37/32174 ,  H01J37/32935 ,  H03H7/40

    摘要： Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are established as a function of the frequency of the power supply sampled after a new process step begins or after a sample control signal changes state. In a second aspect, a second pair of lower and upper limits are not adapted to the frequency of the power supply. Both aspects preferably are used together to detect different occurrences of abnormal conditions.

    摘要翻译： 通过检测可变频率RF电源的频率是否移动到建立的下限和上限之外，来检测RF供电的等离子体处理室内的异常情况。 在第一方面，根据在新处理步骤开始之后或在采样控制信号改变状态之后采样的电源的频率，建立第一对下限和上限。 在第二方面，第二对下限和上限不适合电源的频率。 两个方面优选一起用于检测异常状况的不同出现。