利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

13 条记录 (耗时 0.077 秒)

    Substrate support
    1.
    发明授权
    Substrate support 有权
    基材支持

    公开(公告)号：US06824343B2

    公开(公告)日：2004-11-30

    申请号：US10084762

    申请日：2002-02-22

    申请人： Shinichi Kurita ,  Wendell T. Blonigan ,  Suhail Anwar ,  Toshio Kiyotake ,  Hung T. Nguyen

    发明人： Shinichi Kurita ,  Wendell T. Blonigan ,  Suhail Anwar ,  Toshio Kiyotake ,  Hung T. Nguyen

    IPC分类号： B65G4724

    CPC分类号： H01L21/68 ,  H01L21/68728 ,  H01L21/68778 ,  H01L21/68792 ,  Y10S414/136 ,  Y10S414/139 ,  Y10S414/141

    摘要： A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.

    摘要翻译： 通常提供用于支撑衬底的方法和装置。 在一个方面，一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。 第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。 在另一方面，具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。 对准机构包括推动构件，其沿朝向支撑件的中心的第一方向推动基板。 推动构件可以另外围绕垂直于第一方向的轴旋转。

    METHODS AND APPARATUS FOR USING A REINFORCED DIFFUSER IN SUBSTRATE PROCESSING
    2.
    发明申请
    METHODS AND APPARATUS FOR USING A REINFORCED DIFFUSER IN SUBSTRATE PROCESSING 审中-公开
    在基板加工中使用增强扩散器的方法和装置

    公开(公告)号：US20070256637A1

    公开(公告)日：2007-11-08

    申请号：US11741745

    申请日：2007-04-28

    申请人： William Bagley ,  Toshio Kiyotake ,  Masahiko Kowaka

    发明人： William Bagley ,  Toshio Kiyotake ,  Masahiko Kowaka

    IPC分类号： C23C16/00

    CPC分类号： C23C16/45565

    摘要： The invention provides methods and apparatus for using a reinforced gas diffuser in substrate processing. A gas diffuser for use in a PECVD processes includes an aluminum plate with reinforcement material embedded within the aluminum plate. The reinforcement material is adapted to support the aluminum plate and maintain a flatness of the aluminum plate. Numerous other aspects are disclosed.

    摘要翻译： 本发明提供了在衬底处理中使用增强气体扩散器的方法和装置。 用于PECVD工艺的气体扩散器包括铝板，其具有嵌入在铝板内的增强材料。 加强材料适于支撑铝板并保持铝板的平整度。 公开了许多其他方面。

    Substrate support bushing
    4.
    发明申请
    Substrate support bushing 有权
    基板支撑衬套

    公开(公告)号：US20050220604A1

    公开(公告)日：2005-10-06

    申请号：US11044245

    申请日：2005-01-27

    申请人： Shinichi Kurita ,  Suhail Anwar ,  Toshio Kiyotake

    发明人： Shinichi Kurita ,  Suhail Anwar ,  Toshio Kiyotake

    IPC分类号： H01L21/68 ,  B65G49/06 ,  C03C17/00 ,  C23C16/458 ,  F16C29/00 ,  F16C29/04 ,  H01L21/00 ,  H01L21/205 ,  H01L21/683 ,  G01V8/00

    CPC分类号： F16C29/046 ,  B65G49/061 ,  B65G2249/02 ,  C03C17/002 ,  C23C16/4584 ,  F16C29/045 ,  H01L21/00

    摘要： An apparatus for supporting a substrate within a processing chamber is provided. In one aspect, a substrate support member is provided comprising a housing having a bore formed therethrough, a support pin at least partially disposed within the bore, and a plurality of bearing elements disposed about the housing. In one aspect, the bearing elements comprise a roller having a central bore formed therethrough, a contoured outer surface, and a shaft at least partially disposed through the central bore. In another aspect, the bearing elements comprise a ball assembly comprising a larger spherical member and four smaller spherical members arranged about the larger spherical member.

    摘要翻译： 提供了一种用于在处理室内支撑衬底的装置。 在一个方面，提供了一种基板支撑构件，其包括具有穿过其中形成的孔的壳体，至少部分地设置在孔内的支撑销和围绕壳体设置的多个轴承元件。 在一个方面，轴承元件包括具有穿过其形成的中心孔的辊，外形轮廓和至少部分地设置穿过中心孔的轴。 在另一方面，轴承元件包括球组件，该球组件包括较大球形构件和围绕较大球形构件布置的四个较小球形构件。

    Substrate support bushing
    5.
    发明授权
    Substrate support bushing 有权
    基板支撑衬套

    公开(公告)号：US08033245B2

    公开(公告)日：2011-10-11

    申请号：US10779130

    申请日：2004-02-12

    申请人： Shinichi Kurita ,  Suhail Anwar ,  Toshio Kiyotake

    发明人： Shinichi Kurita ,  Suhail Anwar ,  Toshio Kiyotake

    IPC分类号： C23C16/50 ,  C23C16/503 ,  C23C16/505 ,  C23C16/458 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22 ,  F16C29/02 ,  F16C19/00 ,  F16C19/50 ,  F16C43/06 ,  F16C33/38

    CPC分类号： F16C29/046 ,  B65G49/061 ,  B65G2249/02 ,  C03C17/002 ,  C23C16/4584 ,  F16C29/045 ,  H01L21/00

    摘要： An apparatus for supporting a substrate within a processing chamber is provided. In one aspect, a substrate support member is provided comprising a housing having a bore formed therethrough, a support pin at least partially disposed within the bore, and a plurality of bearing elements disposed about the housing. In one aspect, the bearing elements comprise a roller having a central bore formed therethrough, a contoured outer surface, and a shaft at least partially disposed through the central bore. In another aspect, the bearing elements comprise a ball assembly comprising a larger spherical member and four smaller spherical members arranged about the larger spherical member.

    摘要翻译： 提供了一种用于在处理室内支撑衬底的装置。 在一个方面，提供了一种基板支撑构件，其包括具有穿过其中形成的孔的壳体，至少部分地设置在孔内的支撑销和围绕壳体设置的多个轴承元件。 在一个方面，轴承元件包括具有穿过其形成的中心孔的辊，外形轮廓和至少部分地设置穿过中心孔的轴。 在另一方面，轴承元件包括球组件，该球组件包括较大球形构件和围绕较大球形构件布置的四个较小球形构件。

    Substrate support
    6.
    发明授权
    Substrate support 失效
    基材支持

    公开(公告)号：US07735710B2

    公开(公告)日：2010-06-15

    申请号：US10990094

    申请日：2004-11-16

    申请人： Shinichi Kurita ,  Wendell T. Blonigan ,  Suhail Anwar ,  Toshio Kiyotake ,  Hung T. Nguyen

    发明人： Shinichi Kurita ,  Wendell T. Blonigan ,  Suhail Anwar ,  Toshio Kiyotake ,  Hung T. Nguyen

    IPC分类号： H01L21/68

    CPC分类号： H01L21/68 ,  H01L21/68728 ,  H01L21/68778 ,  H01L21/68792 ,  Y10S414/136 ,  Y10S414/139 ,  Y10S414/141

    摘要： A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.

    摘要翻译： 通常提供用于支撑衬底的方法和装置。 在一个方面，一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。 第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。 在另一方面，具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。 对准机构包括推动构件，其沿朝向支撑件的中心的第一方向推动基板。 推动构件可以另外围绕垂直于第一方向的轴旋转。

    Sensors for dynamically detecting substrate breakage and misalignment of a moving substrate
    8.
    发明授权
    Sensors for dynamically detecting substrate breakage and misalignment of a moving substrate 有权
    用于动态检测基板破损和移动基板未对准的传感器

    公开(公告)号：US07440091B2

    公开(公告)日：2008-10-21

    申请号：US10973116

    申请日：2004-10-26

    申请人： William A. Bagley ,  Paohuei Lee ,  Kyung-Tae Kim ,  Sam-Kyung Kim ,  Toshio Kiyotake ,  Sam Kim ,  Takayuki Matsumoto ,  Jonathan Erik Larson ,  Makoto Inagawa ,  James Hoffman ,  Billy C. Leung

    发明人： William A. Bagley ,  Paohuei Lee ,  Kyung-Tae Kim ,  Sam-Kyung Kim ,  Toshio Kiyotake ,  Sam Kim ,  Takayuki Matsumoto ,  Jonathan Erik Larson ,  Makoto Inagawa ,  James Hoffman ,  Billy C. Leung

    IPC分类号： G01N21/00

    CPC分类号： H01L21/67265 ,  G01N21/9501

    摘要： An apparatus and method incorporating at least two sensors that detect the presence of substrate defects, such as breakage or misalignment, along the lengths of at least two parallel edges of a moving substrate. In one embodiment, an apparatus for detecting substrate defects includes a sensor arrangement including at least two sensors that continuously sense a substrate near at least two parallel edges of the substrate as the substrate passes the sensors. In another embodiment, an apparatus for detecting substrate defects includes a robot having a substrate support surface, and a sensor arrangement including at least two sensors that continuously sense a substrate near at least two parallel edges of the substrate during substrate transfer on the substrate support surface. In another embodiment, a method of continuously detecting substrate defects includes positioning at least two sensors to continuously sense a substrate near at least two parallel edges of the substrate as the substrate passes the sensors, and transmitting a signal from each of the at least two sensors to a controller that continuously monitors the signals from the at least two sensors to detect the presence of a substrate defect.

    摘要翻译： 一种装置和方法，其结合有至少两个传感器，其沿着移动基板的至少两个平行边缘的长度检测基板缺陷的存在，例如断裂或未对准。 在一个实施例中，用于检测衬底缺陷的装置包括传感器装置，其包括至少两个传感器，当衬底通过传感器时，至少两个传感器连续感测衬底的至少两个平行边缘附近的衬底。 在另一个实施例中，一种用于检测衬底缺陷的装置包括具有衬底支撑表面的机器人，以及包括至少两个传感器的传感器装置，所述传感器装置包括至少两个传感器，所述至少两个传感器在衬底支承表面 。 在另一个实施例中，连续检测衬底缺陷的方法包括：当衬底通过传感器时，定位至少两个传感器以连续地感测衬底的至少两个平行边缘附近的衬底，并且从至少两个传感器 涉及连续地监视来自至少两个传感器的信号以检测衬底缺陷的存在的控制器。

    VERTICALLY MOUNTED ROTARY CATHODES IN SPUTTERING SYSTEM ON ELEVATED RAILS
    9.
    发明申请
    VERTICALLY MOUNTED ROTARY CATHODES IN SPUTTERING SYSTEM ON ELEVATED RAILS 审中-公开
    高空作业系统中垂直安装的旋转阴极

    公开(公告)号：US20080127887A1

    公开(公告)日：2008-06-05

    申请号：US11565968

    申请日：2006-12-01

    申请人： Samuel Leung ,  Andreas Geiss ,  Toshio Kiyotake ,  Erkan Koparal ,  Jose Albor ,  William Allan Bagley

    发明人： Samuel Leung ,  Andreas Geiss ,  Toshio Kiyotake ,  Erkan Koparal ,  Jose Albor ,  William Allan Bagley

    IPC分类号： C23C14/00

    CPC分类号： H01J37/3402 ,  H01J37/3435

    摘要： The present invention generally comprises a physical vapor deposition (PVD) system having separate susceptor, cathode, and lid sections in which each section is on a rail that elevates the sections off the ground. The cathode section may comprise a plurality of rotatable cathodes that lie in a plane such that the axis of rotation for the rotary cathodes is perpendicular to the ground. The lid section and the cathode section may be moved on the rails to open the cathode section for servicing. Of the plurality of rotatable cathodes, the cathodes corresponding to the center of the substrate upon which material will be deposited are spaced a greater distance from the substrate than rotatable cathodes corresponding to the edge of the substrate.

    摘要翻译： 本发明通常包括具有单独的基座，阴极和盖部分的物理气相沉积（PVD）系统，其中每个部分在轨道上，使部分离开地面。 阴极部分可以包括位于平面中的多个可旋转的阴极，使得旋转阴极的旋转轴线垂直于地面。 盖部分和阴极部分可以在轨道上移动以打开阴极部分进行维修。 在多个可旋转阴极中，对应于衬底的中心的阴极将与衬底相对应的可旋转阴极与衬底间隔开距离更大的距离。

    Substrate support
    10.
    发明申请
    Substrate support 失效
    基材支持

    公开(公告)号：US20050063800A1

    公开(公告)日：2005-03-24

    申请号：US10990094

    申请日：2004-11-16

    申请人： Shinichi Kurita ,  Wendell Blonigan ,  Suhail Anwar ,  Toshio Kiyotake ,  Hung Nguyen

    发明人： Shinichi Kurita ,  Wendell Blonigan ,  Suhail Anwar ,  Toshio Kiyotake ,  Hung Nguyen

    IPC分类号： B65G49/07 ,  H01L21/205 ,  H01L21/68 ,  H01L21/687 ,  H05K1/14 ,  B65G1/00

    CPC分类号： H01L21/68 ,  H01L21/68728 ,  H01L21/68778 ,  H01L21/68792 ,  Y10S414/136 ,  Y10S414/139 ,  Y10S414/141

    摘要： A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.

    摘要翻译： 通常提供用于支撑衬底的方法和装置。 在一个方面，一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。 第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。 在另一方面，具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。 对准机构包括推动构件，其沿朝向支撑件的中心的第一方向推动基板。 推动构件可以另外围绕垂直于第一方向的轴旋转。