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    Radiation sensitive polymeric diazonium salt and methods of making the polymeric diazonium salt
    1.
    发明授权
    Radiation sensitive polymeric diazonium salt and methods of making the polymeric diazonium salt 失效
    辐射敏感聚合物重氮盐和制备聚合重氮盐的方法

    公开(公告)号：US4902601A

    公开(公告)日：1990-02-20

    申请号：US300699

    申请日：1989-01-19

    申请人： Rodney M. Potts ,  Michael J. Pratt ,  Keith M. Fletcher

    发明人： Rodney M. Potts ,  Michael J. Pratt ,  Keith M. Fletcher

    IPC分类号： C08F8/30 ,  C08F8/44 ,  C08F12/00 ,  C08F12/26 ,  C08F20/22 ,  C08F20/36 ,  G03F7/016 ,  G03F7/021

    CPC分类号： G03F7/021

    摘要： Radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture is based on a polymer including a plurality of structural units represented by the formula: ##STR1## in which, R represents H or CH.sub.3 ; each R.sub.1, which may be the same or different represents H or alkyl; R.sub.2 represents a single bond or a substituted or unsubstituted divalent radical; Ar represents a substituted or unsubstituted divalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or NH; A represents an anion; Y represents a carbonyl oxy or aromatic radical; and n is an integer equal to or greater than 1.

    摘要翻译： 适用于生产用于平版印刷版制造的辐射敏感板的辐射敏感材料基于包含由下式表示的多个结构单元的聚合物：其中R表示H或CH 3; 每个R 1可以相同或不同，表示H或烷基; R2表示单键或取代或未取代的二价基; Ar表示衍生自芳族或杂芳族化合物的取代或未取代的二价基团; X表示O，S或NH; A代表阴离子; Y表示羰基氧基或芳基; n为1以上的整数。