公开(公告)号：US20080050866A1

公开(公告)日：2008-02-28

申请号：US11927780

申请日：2007-10-30

申请人： Roger Booth ,  Jack Mandelman ,  William Tonti

发明人： Roger Booth ,  Jack Mandelman ,  William Tonti

IPC分类号： H01L21/336

CPC分类号： H01L27/092 ,  H01L21/823807 ,  H01L21/823821 ,  H01L21/823828 ,  H01L21/82385 ,  H01L21/823878 ,  H01L21/845 ,  H01L27/0924 ,  H01L27/1211 ,  H01L29/66795 ,  H01L29/785

摘要： Methods of forming a semiconductor structure having FinFET's and planar devices, such as MOSFET's, on a common substrate by a damascene approach, and semiconductor structures formed by the methods. A semiconductor fin of the FinFET is formed on a substrate with damascene processing in which the fin growth may be interrupted to implant ions that are subsequently transformed into a region that electrically isolates the fin from the substrate. The isolation region is self-aligned with the fin because the mask used to form the damascene-body fin also serves as an implantation mask for the implanted ions. The fin may be supported by the patterned layer during processing that forms the FinFET and, more specifically, the gate of the FinFET. The electrical isolation surrounding the FinFET may also be supplied by a self-aligned process that recesses the substrate about the FinFET and at least partially fills the recess with a dielectric material.

摘要翻译： 通过镶嵌法在公共衬底上形成具有FinFET和诸如MOSFET的平面器件的半导体结构的方法以及通过该方法形成的半导体结构。 FinFET的半导体鳍形成在具有镶嵌处理的衬底上，其中翅片生长可以被中断以注入离子，随后将其转换成将鳍片与衬底电隔离的区域。 隔离区域与翅片自对准，因为用于形成镶嵌体体翅片的掩模也用作注入离子的注入掩模。 翅片可以在形成FinFET的处理期间由图案化层支撑，更具体地，FinFET的栅极支撑。 围绕FinFET的电隔离也可以通过自对准工艺来提供，该工艺使得衬底围绕FinFET凹陷，并且用电介质材料至少部分地填充凹部。

公开(公告)号：US20080029843A1

公开(公告)日：2008-02-07

申请号：US11873197

申请日：2007-10-16

申请人： Roger Booth ,  William Hovis ,  Jack Mandelman ,  William Tonti

发明人： Roger Booth ,  William Hovis ,  Jack Mandelman ,  William Tonti

IPC分类号： H01L29/41

CPC分类号： H01L23/5256 ,  H01L2924/0002 ,  H01L2924/00

摘要： An E-fuse and a method for fabricating an E-fuse integrating polysilicon resistor masks, and a design structure on which the subject E-fuse circuit resides are provided. The E-fuse includes a polysilicon layer defining a fuse shape including a cathode, an anode, and a fuse neck connected between the cathode and the anode silicide formation. A silicide formation is formed on the polysilicon layer with an unsilicided portion extending over a portion of the cathode adjacent the fuse neck. The unsilicided portion substantially prevents current flow in the silicide formation region of the cathode, with electromigration occurring in the fuse neck during fuse programming. The unsilicided portion has a substantially lower series resistance than the series resistance of the fuse neck.

摘要翻译： 一种电熔丝和一种用于制造集成多晶硅电阻掩模的电子熔丝的方法，以及设置有被检体E熔丝回路的设计结构。 电熔丝包括限定熔丝形状的多晶硅层，其包括阴极，阳极和连接在阴极和阳极硅化物层之间的保险丝颈。 硅化物形成在多晶硅层上形成，其中非硅化部分在靠近熔丝颈部的阴极的一部分上延伸。 非接触部分基本上防止电流在阴极的硅化物形成区域中流动，在保险丝编程期间在保险丝颈部发生电迁移。 非接触部分具有比熔丝颈部的串联电阻显着更低的串联电阻。

公开(公告)号：US20060286779A1

公开(公告)日：2006-12-21

申请号：US11155029

申请日：2005-06-16

申请人： Roger Booth ,  Louis Hsu ,  Jack Mandelman ,  William Tonti

发明人： Roger Booth ,  Louis Hsu ,  Jack Mandelman ,  William Tonti

IPC分类号： H01L21/76 ,  H01L21/00

CPC分类号： H01L21/76243

摘要： In an aspect, a method is provided for forming a silicon-on-insulator (SOI) layer. The method includes the steps of (1) providing a silicon substrate; (2) selectively implanting the silicon substrate with oxygen using a low implant energy to form an ultra-thin patterned seed layer; and (3) employing the ultra-thin patterned seed layer to form a patterned SOI layer on the silicon substrate. Numerous other aspects are provided.

摘要翻译： 在一方面，提供了一种用于形成绝缘体上硅（SOI）层的方法。 该方法包括以下步骤：（1）提供硅衬底; （2）使用低注入能量用氧选择性地注入硅衬底以形成超薄图案种子层; 和（3）使用超薄图案种子层在硅衬底上形成图案化SOI层。 提供了许多其他方面。

公开(公告)号：US20080048265A1

公开(公告)日：2008-02-28

申请号：US11927110

申请日：2007-10-29

申请人： Roger Booth ,  Jack Mandelman ,  William Tonti

发明人： Roger Booth ,  Jack Mandelman ,  William Tonti

IPC分类号： H01L27/12

CPC分类号： H01L27/092 ,  H01L21/823807 ,  H01L21/823821 ,  H01L21/823828 ,  H01L21/82385 ,  H01L21/823878 ,  H01L21/845 ,  H01L27/0924 ,  H01L27/1211 ,  H01L29/66795 ,  H01L29/785

摘要： Methods of forming a semiconductor structure having FinFET's and planar devices, such as MOSFET's, on a common substrate by a damascene approach, and semiconductor structures formed by the methods. A semiconductor fin of the FinFET is formed on a substrate with damascene processing in which the fin growth may be interrupted to implant ions that are subsequently transformed into a region that electrically isolates the fin from the substrate. The isolation region is self-aligned with the fin because the mask used to form the damascene-body fin also serves as an implantation mask for the implanted ions. The fin may be supported by the patterned layer during processing that forms the FinFET and, more specifically, the gate of the FinFET. The electrical isolation surrounding the FinFET may also be supplied by a self-aligned process that recesses the substrate about the FinFET and at least partially fills the recess with a dielectric material.

公开(公告)号：US20070210412A1

公开(公告)日：2007-09-13

申请号：US11372380

申请日：2006-03-09

申请人： Roger Booth ,  Kangguo Cheng ,  Jack Mandelman ,  William Tonti

发明人： Roger Booth ,  Kangguo Cheng ,  Jack Mandelman ,  William Tonti

IPC分类号： H01L29/00

CPC分类号： H01L23/5256 ,  H01L2924/0002 ,  H01L2924/00

摘要： Electrically programmable fuse structures for an integrated circuit and methods of fabrication thereof are presented, wherein the electrically programmable fuse has a first terminal portion and a second terminal portion interconnected by a fuse element. The first terminal portion and the second terminal portion reside over a first support and a second support, respectively, with the first support and the second support being spaced apart, and the fuse element bridging the distance between the first terminal portion over the first support and the second terminal portion over the second support. The fuse, first support and second support define a π-shaped structure in elevational cross-section through the fuse element. The first terminal portion, second terminal portion and fuse element are coplanar, with the fuse element residing above a void, which in one embodiment is filed by a thermally insulating dielectric material that surrounds the fuse element.

摘要翻译： 提出了用于集成电路的电可编程熔丝结构及其制造方法，其中电可编程熔丝具有由熔丝元件互连的第一端子部分和第二端子部分。 第一端子部分和第二端子部分分别驻留在第一支撑件和第二支撑件上，第一支撑件和第二支撑件间隔开，并且熔丝元件将第一端子部分之间的距离跨越第一支撑件和 在第二支撑件上方的第二端子部分。 保险丝，第一支撑件和第二支撑件通过保险丝元件在垂直截面中限定了一个pi形结构。 第一端子部分，第二端子部分和熔丝元件是共面的，其中熔丝元件位于空隙上方，在一个实施例中，熔断元件由围绕熔丝元件的绝热介电材料覆盖。

公开(公告)号：US20080052659A1

公开(公告)日：2008-02-28

申请号：US11923833

申请日：2007-10-25

申请人： Roger Booth ,  Kangguo Cheng ,  Jack Mandelman ,  William Tonti

发明人： Roger Booth ,  Kangguo Cheng ,  Jack Mandelman ,  William Tonti

IPC分类号： G06F17/50

CPC分类号： H01L23/5256 ,  H01L2924/0002 ,  H01L2924/00

摘要： Electrically programmable fuses for an integrated circuit and design structures thereof are presented, wherein the electrically programmable fuse has a first terminal portion and a second terminal portion interconnected by a fuse element. The first terminal portion and the second terminal portion reside over a first support and a second support, respectively, with the first support and the second support being spaced apart, and the fuse element bridging the distance between the first terminal portion over the first support and the second terminal portion over the second support. The fuse, first support and second support define a π-shaped structure in elevational cross-section through the fuse element. The first terminal portion, second terminal portion and fuse element are coplanar, with the fuse element residing above a void. The design structure for the fuse is embodied in a machine-readable medium for designing, manufacturing or testing a design of the fuse.

摘要翻译： 提出了用于集成电路的电可编程保险丝及其设计结构，其中电可编程熔丝具有由熔丝元件互连的第一端子部分和第二端子部分。 第一端子部分和第二端子部分分别驻留在第一支撑件和第二支撑件上，第一支撑件和第二支撑件间隔开，并且熔丝元件将第一端子部分之间的距离跨越第一支撑件和 在第二支撑件上方的第二端子部分。 保险丝，第一支撑件和第二支撑件通过保险丝元件在垂直截面中限定了一个pi形结构。 第一端子部分，第二端子部分和熔丝元件是共面的，其中熔丝元件位于空隙之上。 保险丝的设计结构体现在用于设计，制造或测试保险丝设计的机器可读介质中。

公开(公告)号：US20070247273A1

公开(公告)日：2007-10-25

申请号：US11768254

申请日：2007-06-26

申请人： Roger Booth ,  Kangguo Cheng ,  Jack Mandelman ,  William Tonti

发明人： Roger Booth ,  Kangguo Cheng ,  Jack Mandelman ,  William Tonti

IPC分类号： H01H85/06 ,  H01L21/336 ,  H01L21/44

CPC分类号： H01L23/5256 ,  H01L2924/0002 ,  H01L2924/00

摘要： Electrically programmable fuse structures for an integrated circuit and methods of fabrication thereof are presented, wherein the electrically programmable fuse has a first terminal portion and a second terminal portion interconnected by a fuse element. The first terminal portion and the second terminal portion reside over a first support and a second support, respectively, with the first support and the second support being spaced apart, and the fuse element bridging the distance between the first terminal portion over the first support and the second terminal portion over the second support. The fuse, first support and second support define a π-shaped structure in elevational cross-section through the fuse element. The first terminal portion, second terminal portion and fuse element are coplanar, with the fuse element residing above a void, which in one embodiment is filed by a thermally insulating dielectric material that surrounds the fuse element.

公开(公告)号：US20080050903A1

公开(公告)日：2008-02-28

申请号：US11876942

申请日：2007-10-23

申请人： Roger BOOTH ,  Jack Mandelman ,  William Tonti

发明人： Roger BOOTH ,  Jack Mandelman ,  William Tonti

IPC分类号： H01L21/44

CPC分类号： H01L23/5256 ,  H01L2924/0002 ,  H01L2924/00

摘要： Electrically programmable fuse structures and methods of fabrication thereof are presented, wherein a fuse includes first and second terminal portions interconnected by an elongate fuse element. The first terminal portion has a maximum width greater than a maximum width of the fuse element, and the fuse includes a narrowed width region where the first terminal portion and fuse element interface. The narrowed width region extends at least partially into and includes part of the first terminal portion. The width of the first terminal portion in the narrowed region is less than the maximum width of the first terminal portion to enhance current crowding therein. In another implementation, the fuse element includes a restricted width region wherein width of the fuse element is less than the maximum width thereof to enhance current crowding therein, and length of the restricted width region is less than a total length of the fuse element.

摘要翻译： 提出了电可编程熔丝结构及其制造方法，其中熔丝包括通过细长的熔丝元件互连的第一和第二端部。 第一端子部分具有大于熔丝元件的最大宽度的最大宽度，并且熔丝包括第一端子部分和熔丝元件接合的变窄的宽度区域。 狭窄宽度区域至少部分地延伸并包括第一端子部分的一部分。 变窄区域中的第一端子部分的宽度小于第一端子部分的最大宽度，以增强其中的电流拥挤。 在另一实施方式中，熔丝元件包括限制宽度区域，其中熔丝元件的宽度小于其最大宽度以增强其中的电流拥挤，并且受限宽度区域的长度小于熔丝元件的总长度。

公开(公告)号：US20070262413A1

公开(公告)日：2007-11-15

申请号：US11382808

申请日：2006-05-11

申请人： Roger Booth ,  William Hovis ,  Jack Mandelman ,  William Tonti

发明人： Roger Booth ,  William Hovis ,  Jack Mandelman ,  William Tonti

IPC分类号： H01L29/00

CPC分类号： H01L23/5256 ,  H01L2924/0002 ,  H01L2924/00

摘要： An E-fuse and a method for fabricating an E-fuse are provided integrating polysilicon resistor masks. The E-fuse includes a polysilicon layer defining a fuse shape including a cathode, an anode, and a fuse neck connected between the cathode and the anode silicide formation. A silicide formation is formed on the polysilicon layer with an unsilicided portion extending over a portion of the cathode adjacent the fuse neck. The unsilicided portion substantially prevents current flow in the silicide formation region of the cathode, with electromigration occurring in the fuse neck during fuse programming. The unsilicided portion has a substantially lower series resistance than the series resistance of the fuse neck.

摘要翻译： 集成了多晶硅电阻掩模的电子熔丝和用于制造电熔丝的方法被提供。 电熔丝包括限定熔丝形状的多晶硅层，其包括阴极，阳极和连接在阴极和阳极硅化物层之间的保险丝颈。 硅化物形成在多晶硅层上形成，其中非硅化部分在靠近熔丝颈部的阴极的一部分上延伸。 非接触部分基本上防止电流在阴极的硅化物形成区域中流动，在保险丝编程期间在保险丝颈部发生电迁移。 非接触部分具有比熔丝颈部的串联电阻显着更低的串联电阻。

公开(公告)号：US20070210413A1

公开(公告)日：2007-09-13

申请号：US11372386

申请日：2006-03-09

申请人： Roger Booth ,  Jack Mandelman ,  William Tonti

发明人： Roger Booth ,  Jack Mandelman ,  William Tonti

IPC分类号： H01L29/00

CPC分类号： H01L23/5256 ,  H01L2924/0002 ,  H01L2924/00

摘要： Electrically programmable fuse structures and methods of fabrication thereof are presented, wherein a fuse includes first and second terminal portions interconnected by an elongate fuse element. The first terminal portion has a maximum width greater than a maximum width of the fuse element, and the fuse includes a narrowed width region where the first terminal portion and fuse element interface. The narrowed width region extends at least partially into and includes part of the first terminal portion. The width of the first terminal portion in the narrowed region is less than the maximum width of the first terminal portion to enhance current crowding therein. In another implementation, the fuse element includes a restricted width region wherein width of the fuse element is less than the maximum width thereof to enhance current crowding therein, and length of the restricted width region is less than a total length of the fuse element.

摘要翻译： 提出了电可编程熔丝结构及其制造方法，其中熔丝包括通过细长的熔丝元件互连的第一和第二端部。 第一端子部分具有大于熔丝元件的最大宽度的最大宽度，并且熔丝包括第一端子部分和熔丝元件接合的变窄的宽度区域。 狭窄宽度区域至少部分地延伸并包括第一端子部分的一部分。 变窄区域中的第一端子部分的宽度小于第一端子部分的最大宽度，以增强其中的电流拥挤。 在另一实施方式中，熔丝元件包括限制宽度区域，其中熔丝元件的宽度小于其最大宽度以增强其中的电流拥挤，并且受限宽度区域的长度小于熔丝元件的总长度。