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1.发明授权Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists 失效窄分子量分布聚合物及其作为负性光致抗蚀剂树脂粘合剂的用途
公开(公告)号：US06107425A
公开(公告)日：2000-08-22
申请号：US20276
申请日：1998-02-06
申请人： Roger F. Sinta , George G. Barclay , Jacque H. Georger, Jr. , Mark D. Denison , Sheri L. Ablaza
发明人： Roger F. Sinta , George G. Barclay , Jacque H. Georger, Jr. , Mark D. Denison , Sheri L. Ablaza
摘要： The invention provides inter alia new methods to produce aqueous developable resin binders for negative-acting photoresists. The methods in general comprise free radical polymerization of one or more types of monomers in the presence of a free radical polymerization control agent, particularly a nitroxide polymerization control agent such as a piperidinyloxy (N-oxy) free radical, and wherein at least one of the monomer types contains a moiety that enables aqueous solution development of a photoresist composition containing the formed polymer.
摘要翻译： 本发明特别提供了用于制备用于负性光致抗蚀剂的水性可显影树脂粘合剂的新方法。 所述方法通常包括在自由基聚合控制剂，特别是氮氧自由基聚合控制剂如哌啶基氧基（N-氧）自由基的存在下，一种或多种类型的单体的自由基聚合，并且其中至少一种 单体类型包含能够使包含形成的聚合物的光致抗蚀剂组合物的水溶液显影的部分。
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公开(公告)号：US5763536A
公开(公告)日：1998-06-09
申请号：US638239
申请日：1996-04-26
CPC分类号： G03F7/0045 , C08F8/00 , C08F8/14
摘要： The invention comprises a polymer formulated for an acid hardened resist system. The polymer is one having acid labile blocking groups and inert blocking groups. The photoresist comprises the polymer and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
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公开(公告)号：US5731386A
公开(公告)日：1998-03-24
申请号：US438185
申请日：1995-05-09
CPC分类号： G03F7/0045 , C08F8/00 , C08F8/14
摘要： The invention comprises a polymer formulated for an acid hardened resist system. The polymer is one having acid labile blocking groups and inert blocking groups. The photoresist comprises the polymer and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
摘要翻译： 本发明包括配制用于酸硬化抗蚀剂体系的聚合物。 该聚合物是具有酸不稳定性封闭基团和惰性封闭基团的聚合物。 光致抗蚀剂包括聚合物和光致酸发生剂。 在树脂上包含惰性封闭基团可改善保质期，而不会有害地影响抗蚀剂的光刻性能。
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公开(公告)号：US5827634A
公开(公告)日：1998-10-27
申请号：US815199
申请日：1997-03-12
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/11 , Y10S430/111
摘要： The invention comprises an acid hardened resist system consisting of a resin binder having acid labile blocking groups and inert blocking groups and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
摘要翻译： 本发明包括由具有酸不稳定性封闭基团和惰性阻挡基团的树脂粘合剂和光酸产生剂组成的酸硬化抗蚀剂体系。 在树脂上包含惰性封闭基团可改善保质期，而不会有害地影响抗蚀剂的光刻性能。
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5.发明授权Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups 失效具有酸性不稳定基团和惰性封闭基团的碱溶性树脂的正性酸催化抗蚀剂
公开(公告)号：US5700624A
公开(公告)日：1997-12-23
申请号：US438180
申请日：1995-05-09
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/11 , Y10S430/111
摘要： The invention comprises an acid hardened resist system consisting of a resin binder having acid labile blocking groups and inert blocking groups and a photoacid generator. The inclusion of inert blocking groups on the resin improves shelf life without deleteriously affecting photolithographic properties of the resist.
摘要翻译： 本发明包括由具有酸不稳定性封闭基团和惰性阻挡基团的树脂粘合剂和光酸产生剂组成的酸硬化抗蚀剂体系。 在树脂上包含惰性封闭基团可改善保质期，而不会有害地影响抗蚀剂的光刻性能。
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公开(公告)号：US5541263A
公开(公告)日：1996-07-30
申请号：US404933
申请日：1995-03-16
CPC分类号： G03F7/0045 , G03F7/0236 , Y10S430/106
摘要： An alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The polymer is used for the formulation of acid hardening photoresists and the presence of the inert blocking group enables development of an exposed photoresist with a strong developer without formation of microbridges between fine line features.
摘要翻译： 具有一部分酚羟基的碱溶性树脂，优选酚醛树脂反应形成对酸或碱为惰性的封闭基团。 聚合物用于配制酸硬化光致抗蚀剂，并且惰性封闭基团的存在使得能够用强显影剂显影曝光的光致抗蚀剂，而不会在细线特征之间形成微桥。
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7.发明授权Radiation sensitive composition comprising polymer having inert blocking groups 失效包含具有惰性封闭基团的聚合物的辐射敏感性组合物
公开(公告)号：US5514520A
公开(公告)日：1996-05-07
申请号：US405800
申请日：1995-03-16
CPC分类号： G03F7/0045 , Y10S430/106
摘要： A photoresist composition consisting of an acid or base generator, a crosslinking agent activated in the presence of an acid or base and an alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The presence of the inert blocking group enables development of an exposed photoresist with a strong developer without formation of microbridges between fine line features.
摘要翻译： 由酸或碱发生剂，在酸或碱存在下活化的交联剂和碱溶性树脂（优选酚醛树脂）组成的光致抗蚀剂组合物，其酚酚羟基的一部分反应形成对于 酸或碱。 惰性阻挡基团的存在使得能够用强显影剂显影曝光的光致抗蚀剂，而不会在细线特征之间形成微桥。
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