公开(公告)号：US20090168042A1

公开(公告)日：2009-07-02

申请号：US12292962

申请日：2008-12-01

申请人： Roger Johannes Maria Hubertus Kroonen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Fransiscus Mathijs Jacobs ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Reinder Wietse Roos ,  Mattijs Hogeland

发明人： Roger Johannes Maria Hubertus Kroonen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Niek Jacobus Johannes Roset ,  Fransiscus Mathijs Jacobs ,  Gerardus Arnoldus Hendricus Franciscus Janssen ,  Reinder Wietse Roos ,  Mattijs Hogeland

IPC分类号： G03B27/60

CPC分类号： G03F7/70341

摘要： An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate, the substrate table being constructed and arranged to allow liquid to flow off the substrate and over an edge of a top surface of the substrate table, and a gutter for collecting the liquid flow under the edge. Several features for improving liquid retrieval are described.

摘要翻译： 公开了一种浸没式光刻投影装置。 所述设备包括用于保持基板的基板台，所述基板台被构造和布置成允许液体从所述基板流出并且超过所述基板台的顶表面的边缘，以及用于收集所述边缘下方的液体流的槽 。 描述了用于改善液体回收的几个特征。

公开(公告)号：US20090168037A1

公开(公告)日：2009-07-02

申请号：US12292963

申请日：2008-12-01

申请人： Roger Johannes Maria Hubertus Kroonen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Ronald Van Der Ham ,  Niek Jacobus Johannes Roset ,  Fransiscus Mathijs Jacobs ,  Michel Riepen ,  Gerardus Arnoldus Hendricus Fanciscus Janssen ,  Reinder Wietse Roos ,  Mattijs Hogeland

发明人： Roger Johannes Maria Hubertus Kroonen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Ronald Van Der Ham ,  Niek Jacobus Johannes Roset ,  Fransiscus Mathijs Jacobs ,  Michel Riepen ,  Gerardus Arnoldus Hendricus Fanciscus Janssen ,  Reinder Wietse Roos ,  Mattijs Hogeland

IPC分类号： G03B27/60 ,  G03B27/52

CPC分类号： G03F7/70716 ,  G03F7/70341

摘要： An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of a top surface of the substrate table. The geometry of the edge may be optimized to reduce a static thickness of a layer of liquid on the top surface.

摘要翻译： 公开了一种浸没式光刻投影装置。 该装置包括用于保持基板的基板台和用于向基板供应液体的液体供应系统。 该装置被构造和布置成允许液体从衬底流出并且在衬底台的顶表面的至少两个边缘之上。 可优化边缘的几何形状以减少顶表面上的液体层的静态厚度。