公开(公告)号：US20050214689A1

公开(公告)日：2005-09-29

申请号：US11132851

申请日：2005-05-19

申请人： Rolf Brenner ,  Tilo Buehler ,  Robert Clark ,  Andrew Dzurak ,  Alexander Hamilton ,  Nancy Lumpkin ,  Rita Paytricia

发明人： Rolf Brenner ,  Tilo Buehler ,  Robert Clark ,  Andrew Dzurak ,  Alexander Hamilton ,  Nancy Lumpkin ,  Rita Paytricia

IPC分类号： G03F7/26 ,  G03F7/20 ,  G06N99/00 ,  H01L21/027 ,  H01L21/266 ,  H01L21/335 ,  H01L21/336 ,  H01L29/66 ,  H01L29/78 ,  H01L49/00 ,  G03F7/00

CPC分类号： G06N99/002 ,  B82Y10/00 ,  H01L21/266 ,  H01L29/66439 ,  H01L49/006

摘要： A silicon substrate is coated with one or more layers of resist. First and second circuit patterns are exposed in sequence, where the second pattern crosses the first pattern. The patterned resist layers are developed to open holes which extend down to the substrate only where the patterns cross over each other. These holes provide a mask suitable for implanting single phosphorous ions in the substrate, for a solid state quantum computer. Further development of the resist layers provides a mask for the deposition of nanoelectronic circuits, such as single electron transistors, aligned to the phosphorous ions.

摘要翻译： 硅衬底涂覆有一层或多层抗蚀剂。 顺序地暴露第一和第二电路图案，其中第二图案与第一图案交叉。 图案化的抗蚀剂层被显影以打开仅在图案彼此交叉的位置向下延伸到基底的孔。 这些孔提供了适用于在固态量子计算机中将衬底中的单个磷离子注入的掩模。 抗蚀剂层的进一步开发提供了用于沉积与磷离子对准的纳米电子电路（例如单电子晶体管）的掩模。

公开(公告)号：US20070103612A1

公开(公告)日：2007-05-10

申请号：US11593163

申请日：2006-11-03

申请人： Nancy Lumpkin

发明人： Nancy Lumpkin

IPC分类号： G02F1/136

CPC分类号： G03F7/70291 ,  G02F1/15

摘要： This invention relates to electrically programmable photolithography masks and to structures fabricated by such masks. An electrically programmable photolithography mask with memory to retain a programmed pattern after programming is described. The mask comprises: a single, photolithographic mask plate to provide a mechanical support for said mask; an array of pixels each pixel comprising an electrically programmable solid-state electro-opaque structure fabricated on said mask plate; a plurality of row electrodes; a plurality of column electrodes; said row and column electrodes defining said pixels and being configured for addressing individual said electro-opaque pixels for programming said mask to define a pattern of optical modulation by the mask; and a thin film protective covering layer over at least said array of electro-opaque pixels.

摘要翻译： 本发明涉及电可编程光刻掩模和由这种掩模制造的结构。 描述了具有存储器的电可编程光刻掩模，用于在编程之后保持编程图案。 掩模包括：单个光刻掩模板，用于为所述掩模提供机械支撑; 每个像素的像素阵列包括在所述掩模板上制造的电可编程固态电不透明结构; 多个行电极; 多个列电极; 所述行和列电极限定所述像素并且被配置用于寻址单独的所述电不透明像素，用于对所述掩模进行编程以限定所述掩模的光学调制图案; 以及至少所述电不透明像素阵列上的薄膜保护覆盖层。