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公开(公告)号：US20240258756A1
公开(公告)日：2024-08-01
申请号：US18564335
申请日：2022-05-06
Applicant: CYMER, LLC
Inventor： Saptaparna Das , Eric Anders Mason
CPC classification number: H01S3/0057 , G02B17/004 , G02B26/00 , H01S3/0071 , H01S3/225 , H01S3/2308
Abstract: A system includes: an optical pulse stretcher including: a first reflective optical element: a second reflective optical element; and an optical coupling system, where a distance between the first reflective optical element and the second reflective optical element defines a separation distance in an optical cavity, and the optical coupling system is configured to bring pulses of light into the cavity and to allow pulses of light to exit the cavity. The system also includes an actuation system configured to control the separation distance; a sensor configured to produce data related to at least two pulses of light that exit the cavity; and a control system coupled to the actuation system, where the control system is configured to control the actuation system and the separation distance based on the data.
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公开(公告)号：US12038567B2
公开(公告)日：2024-07-16
申请号：US17858765
申请日：2022-07-06
Applicant: Gigaphoton Inc.
Inventor： Hirotaka Miyamoto , Osamu Wakabayashi
IPC: G03F7/20 , G02B5/30 , G02B17/02 , G02B26/08 , G02B27/28 , G03F7/00 , H01S3/00 , H01S3/08 , H01S3/225 , H01S3/23
CPC classification number: G02B17/023 , G02B5/3083 , G02B26/0816 , G02B27/283 , G03F7/70025 , G03F7/70041 , G03F7/70308 , G03F7/70316 , H01S3/0057 , H01S3/08009 , H01S3/225 , H01S3/2366 , G02B2207/117
Abstract: A pulse width expansion apparatus according to an aspect of the present disclosure includes a polarization beam splitter and a transfer optical system. The transfer optical system includes ¼-wavelength and reflection mirror pairs. The ¼-wavelength mirror pair include first and second ¼-wavelength mirrors. The first ¼-wavelength mirror provides ¼-wavelength phase shift and reflects a pulse laser beam. The second ¼-wavelength mirror provides ¼-wavelength phase shift and reflects the pulse laser beam reflected by the first ¼-wavelength mirror. The reflection mirror pair are disposed on an optical path before and after or between the ¼-wavelength mirror pair. The transfer optical system transfers an image of an input pulse laser beam on the polarization beam splitter to the optical path between the ¼-wavelength mirror pair at one-to-one magnification as a first transfer image and transfers the first transfer image to the polarization beam splitter at one-to-one magnification as a second transfer image.
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公开(公告)号：US20240146011A1
公开(公告)日：2024-05-02
申请号：US18408777
申请日：2024-01-10
Applicant: Gigaphoton Inc.
Inventor： Koji ASHIKAWA , Shinichi MATSUMOTO
Abstract: A gas laser device includes a chamber device including electrodes at an inside thereof to be filled with laser gas and configured to output, through a window to an outside thereof, light generated from the laser gas when a voltage is applied to the electrodes; a mirror arranged at the outside of the chamber device and configured to reflect at least a part of the light output through the window; a holding portion holding the mirror; a support member configured to support the holding portion to be movable along a plane perpendicular to an optical axis of the light output through the window; a moving mechanism configured to move the holding portion with respect to the support member along the plane; and an angle maintaining mechanism configured to maintain an inclination angle of the holding portion with respect to the support member at a predetermined angle.
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公开(公告)号：US11949203B2
公开(公告)日：2024-04-02
申请号：US16965461
申请日：2019-01-10
Applicant: Cymer, LLC
IPC: H01S3/00 , B01D53/04 , B01D53/30 , B01F23/10 , B01F35/21 , B01F35/221 , G01N33/00 , H01S3/036 , H01S3/225
CPC classification number: H01S3/036 , B01D53/04 , B01D53/30 , B01F23/191 , B01F35/2132 , B01F35/2211 , G01N33/0004 , H01S3/225 , B01D2253/104 , B01D2256/18 , B01D2257/102 , B01D2257/104 , B01D2257/204 , B01D2257/2066 , B01D2257/504 , B01D2257/553 , B01D2257/80
Abstract: A gas chamber supply system includes a gas source configured to fluidly connect to a gas chamber and to supply a gas mixture to the gas chamber, the gas source including: a pre-prepared gas supply including a gas mixture, the gas mixture including a plurality of gas components and lacking a halogen; a recycled gas supply including the gas mixture; and a fluid flow switch connected to the pre-prepared gas supply and to the recycled gas supply. The gas chamber supply also includes a control system configured to: determine if the relative concentration between the gas components within the recycled gas supply is within an acceptable range; and provide a signal to the fluid flow switch to thereby select one of the pre-prepared gas supply and the recycled gas supply to as the gas source based on the determination.
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公开(公告)号：US11947263B2
公开(公告)日：2024-04-02
申请号：US17457514
申请日：2021-12-03
Applicant: Gigaphoton Inc.
Inventor： Makoto Tanaka , Yosuke Fujimaki , Takashi Ito , Yousuke Kawagoe
CPC classification number: G03F7/70025 , F04D23/00 , F04D29/667 , H01S3/036 , H01S3/225
Abstract: A laser chamber of a discharge-excitation-type gas laser apparatus may include a container which contains laser gas therein; a pair of discharge electrodes arranged in the container; a cross flow fan configured to supply the laser gas to a discharge space between the discharge electrodes, the cross flow fan including a rotation shaft with which the cross flow fan rotates in a predetermined rotation direction and a plurality of blades, each longitudinal direction of which is parallel to an axial direction of the rotation shaft; and a stabilizer arranged outside a rotation trajectory of the cross flow fan, and arranged such that a difference between a maximum position and a minimum position of an end portion in the rotation direction on a side opposite to the rotation direction is larger than 0 and is smaller than an interval of two blades adjacent to each other among the plurality of blades.
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Patent Agency Ranking
公开(公告)号：US11870209B2
公开(公告)日：2024-01-09
申请号：US17517982
申请日：2021-11-03
Applicant: Gigaphoton Inc.
Inventor： Yuki Tamaru , Taisuke Miura
CPC classification number: H01S3/2325 , H01S3/225
Abstract: A laser system includes a beam shaping unit, a random phase plate, and a collimating optical system in an optical path between a solid-state laser device and an excimer amplifier. When a traveling direction of a laser beam entering the excimer amplifier is a Z direction, a discharge direction of a pair of discharge electrodes is a V direction, a direction orthogonal to the V and Z directions is an H direction, a shaping direction of the beam shaping unit corresponding to the V direction is a first direction, a shaping direction of the beam shaping unit corresponding to the H direction is a second direction, an expansion rate in the first direction is E1, and an expansion rate in the second direction is E2, the beam shaping unit expands a beam section of the laser beam such that an expansion ratio defined by E2/E1 is lower than 1.
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公开(公告)号：US11721947B2
公开(公告)日：2023-08-08
申请号：US17488078
申请日：2021-09-28
Inventor： Sangho Jeon , Junsung Kang , Zhaoli Lu , Songlin Liu , Ruoyao Li , Hailan Piao
CPC classification number: H01S3/13 , H01S3/0071 , H01S3/2207 , H01S3/225
Abstract: An optical compensation system for a laser beam and an excimer laser annealing device are provided in the present disclosure. The optical compensation system for the laser beam includes a laser source, a beam splitter and a reversion assembly. The laser beam emitted by the laser source enters the beam splitter, and is divided by the beam splitter into a first light beam and a second light beam having different transmission paths. The second light beam is reversed and reflected by the reversion assembly, enters the beam splitter, and exits from the beam splitter together with the first light beam. An asymmetry of the second light beam reversed by the reversion assembly is different from an asymmetry of the first light beam.
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公开(公告)号：US20190252846A1
公开(公告)日：2019-08-15
申请号：US16396072
申请日：2019-04-26
Inventor： Weihua JIANG , Hiroshi UMEDA , Hakaru MIZOGUCHI , Takashi MATSUNAGA , Hiroaki TSUSHIMA , Tomoyuki OHKUBO
CPC classification number: H01S3/09702 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/08009 , H01S3/0971 , H01S3/10069 , H01S3/134 , H01S3/225
Abstract: A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively. The secondary electric circuit may include a number “n” of secondary coils connected in series to one another, and a number “n” of diodes each connected to opposite ends of each of the “n” secondary coils, to prevent a reverse current flowing from the pair of discharge electrodes toward the secondary coils.
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公开(公告)号：US20190181607A1
公开(公告)日：2019-06-13
申请号：US16266357
申请日：2019-02-04
Applicant: Gigaphoton Inc.
Inventor： Hirotaka MIYAMOTO , Osamu WAKABAYASHI
CPC classification number: H01S3/137 , G01J3/0229 , H01S3/08009 , H01S3/0812 , H01S3/225 , H01S3/2251 , H01S3/2256
Abstract: A laser apparatus includes first and second wavelength dispersion elements, an optical element, first and second actuators, and a control unit. The first wavelength dispersion element generates wavelength dispersion in a direction orthogonal to an electric discharge direction between a pair of electric discharge electrodes. The second wavelength dispersion element generates wavelength dispersion in a direction parallel to the electric discharge direction. The optical element corrects wavelength dispersion generated by the second wavelength dispersion element. The first actuator drives the first wavelength dispersion element. The second actuator drives the optical element. The control unit controls the first actuator so that the center wavelength of the laser light approaches to a target wavelength and controls the second actuator so as to correct the wavelength dispersion generated by the second wavelength dispersion element.
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公开(公告)号：US20180277374A1
公开(公告)日：2018-09-27
申请号：US15796514
申请日：2017-10-27
Applicant: BOE TECHNOLOGY GROUP CO., LTD.
Inventor： Xiangjun Tian , Yan Chen , Xueyong Wang , Zhi Wang
IPC: H01L21/268 , H01L21/67 , H01L21/324 , H01L21/02 , H01S3/036
CPC classification number: H01S3/08059 , H01L21/02422 , H01L21/02595 , H01L21/2686 , H01L21/324 , H01L21/67098 , H01S3/034 , H01S3/036 , H01S3/225 , H01S3/23
Abstract: The embodiments of the present disclosure provide an optical device and an excimer laser annealing equipment. The optical device includes: a light source; a transparent window spaced apart from the light source by a distance; and an optical system disposed between the light source and the transparent window. The transparent window is configured such that emergent light of the light source is vertically incident onto the transparent window after passing through the optical system.
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