公开(公告)号：US12124053B2

公开(公告)日：2024-10-22

申请号：US18081971

申请日：2022-12-15

Applicant: Cymer, LLC

Inventor： Eric Anders Mason

IPC: G02B26/00 ,  G01J3/06 ,  G01J3/14 ,  G01J3/18 ,  G02B5/04 ,  G02B27/12 ,  G02B27/14 ,  G02B27/42 ,  G03F7/00 ,  H01L21/027 ,  H01S3/00 ,  H01S3/08 ,  H01S3/23 ,  G01J3/12 ,  H01S3/225

CPC classification number: G02B27/4244 ,  G01J3/06 ,  G01J3/14 ,  G01J3/1804 ,  G02B26/007 ,  G03F7/70575 ,  H01L21/0275 ,  H01S3/0085 ,  H01S3/08004 ,  H01S3/2308 ,  G01J2003/061 ,  G01J2003/063 ,  G01J2003/064 ,  G01J2003/069 ,  G01J2003/1208 ,  H01S3/08009 ,  H01S3/225 ,  H01S3/2366

Abstract: A spectral feature selection apparatus includes a dispersive optical element arranged to interact with a pulsed light beam; three or more refractive optical elements arranged in a path of the pulsed light beam between the dispersive optical element and a pulsed optical source; and one or more actuation systems, each actuation system associated with a refractive optical element and configured to rotate the associated refractive optical element to thereby adjust a spectral feature of the pulsed light beam. At least one of the actuation systems is a rapid actuation system that includes a rapid actuator configured to rotate its associated refractive optical element about a rotation axis. The rapid actuator includes a rotary stepper motor having a rotation shaft that rotates about a shaft axis that is parallel with the rotation axis of the associated refractive optical element.

公开(公告)号：US20240291226A1

公开(公告)日：2024-08-29

申请号：US18571826

申请日：2022-06-02

Applicant: Cymer, LLC

Inventor： Siyu Chen ,  Spencer Ryan Williams

IPC: H01S3/134 ,  G03F7/00 ,  G03F7/20 ,  H01S3/036 ,  H01S3/13 ,  H01S3/225 ,  H01S3/23

CPC classification number: H01S3/134 ,  H01S3/036 ,  H01S3/1305 ,  H01S3/225 ,  H01S3/2308 ,  H01S3/2366 ,  G03F7/2004 ,  G03F7/70025

Abstract: A gas control apparatus includes a control system in communication with a gas discharge chamber. The control system includes a performance monitoring module configured to, during standard mode of operation of the gas discharge chamber and in between performance of gas recovery schemes on the gas discharge chamber that use a gas recovery setting: compare one or more performance parameters of the gas discharge chamber to respective thresholds; determine whether the gas recovery setting needs to be adjusted based on the comparison; and adjust the value for the gas recovery setting based on the determination. The control system includes a gas recovery module configured to perform the gas recovery scheme, the gas recovery module being configured to access the most recently adjusted value for the gas recovery setting from the performance monitoring module when performing the current gas recovery scheme.

公开(公告)号：US20190190229A1

公开(公告)日：2019-06-20

申请号：US16232321

申请日：2018-12-26

Applicant: Cymer, LLC

Inventor： Tanuj Aggarwal

IPC: H01S3/134 ,  H01S3/225 ,  H01S3/13 ,  H01S3/038 ,  H01S3/097 ,  H01S3/104 ,  H01S3/036

CPC classification number: H01S3/134 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/1305 ,  H01S3/225 ,  H01S3/2308 ,  H01S3/2366

Abstract: In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.

公开(公告)号：US20180107017A1

公开(公告)日：2018-04-19

申请号：US15295280

申请日：2016-10-17

Applicant: Cymer, LLC

Inventor： Eric Anders Mason

IPC: G02B27/42 ,  H01S3/23 ,  H01S3/00 ,  G02B26/00 ,  H01L21/027

CPC classification number: G02B27/4244 ,  G01J3/06 ,  G01J3/14 ,  G01J3/1804 ,  G01J2003/061 ,  G01J2003/063 ,  G01J2003/064 ,  G01J2003/069 ,  G01J2003/1208 ,  G02B26/007 ,  G03F7/70575 ,  H01L21/0275 ,  H01S3/0085 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/225 ,  H01S3/2308 ,  H01S3/2366

Abstract: A spectral feature selection apparatus includes a dispersive optical element arranged to interact with a pulsed light beam; three or more refractive optical elements arranged in a path of the pulsed light beam between the dispersive optical element and a pulsed optical source; and one or more actuation systems, each actuation system associated with a refractive optical element and configured to rotate the associated refractive optical element to thereby adjust a spectral feature of the pulsed light beam. At least one of the actuation systems is a rapid actuation system that includes a rapid actuator configured to rotate its associated refractive optical element about a rotation axis. The rapid actuator includes a rotary stepper motor having a rotation shaft that rotates about a shaft axis that is parallel with the rotation axis of the associated refractive optical element.

公开(公告)号：US20180052059A1

公开(公告)日：2018-02-22

申请号：US15800329

申请日：2017-11-01

Applicant: Gigaphoton Inc.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI ,  Yoshinobu WATABE

IPC: G01J11/00 ,  G02B27/14 ,  G02B5/30 ,  G01J4/04 ,  H01S3/00 ,  H01S3/134 ,  G01J1/04

CPC classification number: G01J11/00 ,  G01J1/0414 ,  G01J1/0429 ,  G01J1/0477 ,  G01J1/4257 ,  G01J4/04 ,  G01J2001/4261 ,  G02B5/3066 ,  G02B27/148 ,  H01S3/0014 ,  H01S3/134 ,  H01S3/2366

Abstract: A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF2.

公开(公告)号：US09647415B2

公开(公告)日：2017-05-09

申请号：US14602208

申请日：2015-01-21

Applicant: Hiroaki Tsushima ,  Osamu Wakabayashi ,  Takashi Matsunaga

Inventor： Hiroaki Tsushima ,  Osamu Wakabayashi ,  Takashi Matsunaga

IPC: H01S3/10 ,  H01S3/00 ,  H01S3/097 ,  H01S3/08 ,  H01S3/0971 ,  H01S3/23

CPC classification number: H01S3/09702 ,  H01S3/0014 ,  H01S3/08009 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/2366

Abstract: A laser apparatus according to embodiment may include: a laser chamber filled with a laser gain medium; a pair of electrodes disposed in the laser chamber; a charger configured to apply a charge voltage for causing a discharge to occur between the pair of the electrodes; a pulse power module configured to covert the charge voltage applied by the charger into a short pulsed voltage, and apply the short pulsed voltage between the pair of the electrodes; and a controller configured to calculate input energies Ein applied to the pair of the electrodes based on the charge voltage, calculate an integration value Einsum of the input energies Ein by integrating the calculated input energies Ein, and determine whether the integration value Einsum exceeds an integration lifetime value Einsumlife of input energy or not.

公开(公告)号：US09634455B1

公开(公告)日：2017-04-25

申请号：US15044677

申请日：2016-02-16

Applicant: Cymer, LLC

Inventor： Tanuj Aggarwal

IPC: H01S3/036 ,  H01S3/225 ,  H01S3/23 ,  H01S3/11

CPC classification number: H01S3/134 ,  H01S3/036 ,  H01S3/0385 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/1305 ,  H01S3/225 ,  H01S3/2308 ,  H01S3/2366

Abstract: One or more operating characteristics of a light source are adjusted by estimating a plurality of extreme values of operating parameters of the light source while operating the light source under a set of extreme test conditions. For each extreme test condition, a group of pulses of energy is supplied to a first gas discharge chamber of the light source while operating the first gas discharge chamber under the extreme test condition to produce a first pulsed amplified light beam; a group of pulses of energy is supplied to a second gas discharge chamber of the light source while operating the second gas discharge chamber under the extreme test condition to produce a second pulsed amplified light beam. An extreme value of an operating parameter for the extreme test condition is measured to thereby estimate the extreme value of the operating parameter.

公开(公告)号：US09257809B2

公开(公告)日：2016-02-09

申请号：US13401734

申请日：2012-02-21

Applicant: Hidenori Watanabe ,  Hiroshi Tanaka ,  Osamu Wakabayashi

Inventor： Hidenori Watanabe ,  Hiroshi Tanaka ,  Osamu Wakabayashi

IPC: H01S3/223 ,  H01S3/03 ,  H01S3/134 ,  H01S3/23 ,  H01S3/036 ,  G03F7/20

CPC classification number: H01S3/03 ,  G03F7/70025 ,  H01S3/036 ,  H01S3/134 ,  H01S3/2316 ,  H01S3/2366

Abstract: A laser device for an exposure apparatus may include: a MOPA-type or MOPO-type laser device including a seed laser and at least one gas discharge-pumped amplifier stage that receives output light from the seed laser as an input, amplifies the light, and outputs the amplified light; and at least one of a laser gas control device that at least changes the total pressure of a laser gas in said amplifier stage in accordance with requested energy and a laser power source control device that at least changes pump intensity of discharge electrodes in said amplifier stage in accordance with said requested energy, in a case where the energy of laser output light from said laser device is to be changed discontinuously in response to a request from an exposure apparatus.

Abstract translation: 用于曝光装置的激光装置可以包括：MOPA型或MOPO型激光装置，其包括种子激光器和至少一个气体放电泵浦放大器级，其接收来自种子激光器的输出光作为输入，放大光， 并输出放大的光; 以及激光气体控制装置中的至少一个，所述激光气体控制装置至少根据所要求的能量来改变所述放大器级中的激光气体的总压力，激光电源控制装置至少改变放大器级中的放电电极的泵浦强度 根据所述要求的能量，在来自所述激光装置的激光输出光的能量将根据来自曝光装置的请求而不连续地改变的情况下。

公开(公告)号：US09184555B2

公开(公告)日：2015-11-10

申请号：US14298563

申请日：2014-06-06

Applicant: Gigaphoton Inc.

Inventor： Masaya Yoshino ,  Takashi Onose ,  Osamu Wakabayashi

IPC: H01S3/23 ,  H01S3/00 ,  H01S3/13 ,  H01S3/134 ,  H01S3/10 ,  H01S3/11 ,  H01S3/225 ,  H01S3/16

CPC classification number: H01S3/2308 ,  H01S3/0057 ,  H01S3/0092 ,  H01S3/10023 ,  H01S3/11 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/1636 ,  H01S3/2251 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2333 ,  H01S3/2366

Abstract: A laser system may include: a master oscillator configured to output pulsed laser light; an amplification device for amplifying the pulsed laser light from the master oscillator; a first timing detector configured to detect a first timing at which the master oscillator outputs the pulsed laser light; a second timing detector configured to detect a second timing at which the amplification device discharges; and a controller configured to, based on results of detection by the first timing detector and the second timing detector, control at least one of the first timing and the second timing so that the amplification device discharges when the pulsed laser light passes through a discharge space of the amplification device.

Abstract translation: 激光系统可以包括：主振荡器，被配置为输出脉冲激光; 用于放大来自主振荡器的脉冲激光的放大装置; 第一定时检测器，被配置为检测主振荡器输出脉冲激光的第一定时; 第二定时检测器，被配置为检测放大装置放电的第二定时; 以及控制器，被配置为基于所述第一定时检测器和所述第二定时检测器的检测结果，控制所述第一定时和所述第二定时中的至少一个，使得当所述脉冲激光通过放电空间时所述放大装置放电 的放大装置。

公开(公告)号：US20150139258A1

公开(公告)日：2015-05-21

申请号：US14602208

申请日：2015-01-21

Applicant: Hiroaki TSUSHIMA ,  Osamu WAKABAYASHI ,  Takashi MATSUNAGA

Inventor： Hiroaki TSUSHIMA ,  Osamu WAKABAYASHI ,  Takashi MATSUNAGA

IPC: H01S3/097

CPC classification number: H01S3/09702 ,  H01S3/0014 ,  H01S3/08009 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/2366

Abstract: A laser apparatus according to embodiment may include: a laser chamber filled with a laser gain medium; a pair of electrodes disposed in the laser chamber; a charger configured to apply a charge voltage for causing a discharge to occur between the pair of the electrodes; a pulse power module configured to covert the charge voltage applied by the charger into a short pulsed voltage, and apply the short pulsed voltage between the pair of the electrodes; and a controller configured to calculate input energies Ein applied to the pair of the electrodes based on the charge voltage, calculate an integration value Einsum of the input energies Ein by integrating the calculated input energies Ein, and determine whether the integration value Einsum exceeds an integration lifetime value Einsumlife of input energy or not.

Abstract translation: 根据实施例的激光装置可以包括：填充有激光增益介质的激光室; 设置在激光室中的一对电极; 充电器，被配置为施加用于在所述一对电极之间发生放电的充电电压; 脉冲功率模块，被配置为将由充电器施加的充电电压转换成短脉冲电压，并且在一对电极之间施加短脉冲电压; 以及控制器，被配置为基于所述充电电压来计算施加到所述一对电极的输入能量Ein，通过对所计算的输入能量Ein进行积分来计算输入能量Ein的积分值Einsum，并且确定积分值Einsum是否超过积分 输入能量的寿命值Einsumlife。