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公开(公告)号：US07382540B2
公开(公告)日：2008-06-03
申请号：US11716679
申请日：2007-03-12
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译： 具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。 第一凸度具有由D1表示的最大直径，并且第二凸度具有由D2表示的最大直径和0.8
2 <1.1。 -
公开(公告)号：US20070247722A1
公开(公告)日：2007-10-25
申请号：US11716679
申请日：2007-03-12
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译： 具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。 第一凸度具有由D 1表示的最大直径，并且第二凸度具有由D 2表示的最大直径和0.8
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公开(公告)号：US20050231813A1
公开(公告)日：2005-10-20
申请号：US10931051
申请日：2004-09-01
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译： 具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。 第一凸度具有由D1表示的最大直径，并且第二凸度具有由D2表示的最大直径和0.8
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公开(公告)号：US07190527B2
公开(公告)日：2007-03-13
申请号：US10931051
申请日：2004-09-01
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/24
摘要： Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8
摘要翻译： 具有大于0.7的数值孔径的折射投影物镜，由设置在两个凸部之间的第一凸面，第二凸面和腰部组成。 第一凸度具有由D1表示的最大直径，并且第二凸度具有由D2表示的最大直径和0.8
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公开(公告)号：US20080316452A1
公开(公告)日：2008-12-25
申请号：US12199998
申请日：2008-08-28
申请人： Aurelian Dodoc , Karl-Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Aurelian Dodoc , Karl-Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski
IPC分类号： G03G15/08
摘要： A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译： 微光刻投影曝光装置包括用于产生投影光（13）和投影透镜（20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120）的照明系统（12） 能够布置在投影透镜的物平面（22）中的光源（24）可以被成像到能够被布置在投影透镜的像平面（28）中的感光层（26）上。 投影透镜被设计用于浸没模式，其中在像侧的投影透镜的最终透镜元件（L5; L205; L605; L705; L805; L905; L1005; L1105）浸没在浸没液体（34; 334a ; 434a; 534a）。 关于投影光（13）透明的终端元件（44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144）被紧固在图像侧的最终透镜元件与光 敏感层。
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6.发明申请Lithography Lens System And Projection Exposure System Provided With At Least One Lithography Lens System Of This Type 有权光刻镜片系统和投影曝光系统提供了这种类型的至少一个平版镜片系统公开(公告)号：US20070258134A1
公开(公告)日：2007-11-08
申请号：US10571267
申请日：2004-07-14
申请人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
发明人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
IPC分类号： G02B17/00
CPC分类号： G03F7/70066 , G03F7/70241
摘要： An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.
摘要翻译： 用于微光刻投影曝光系统的光学成像系统用于将布置在成像系统的物体平面中的物体场成像为布置在成像系统的图像平面中的图像场。 特别是可以涉及在照明系统中使用的投影物镜或中继物镜。 成像系统具有布置在物平面和图像平面之间的多个透镜，并且在每种情况下具有第一透镜表面和第二透镜表面。 至少一个透镜是双非球面透镜，其中第一透镜表面和第二透镜表面是非球面。 对于具有可接受的关于透镜表面的表面处理和测试的费用的双非球面透镜的情况，可以产生具有非常强的变形非球面作用的良好质量的透镜。
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公开(公告)号：US07277231B2
公开(公告)日：2007-10-02
申请号：US11097398
申请日：2005-04-01
IPC分类号： G02B1/06
CPC分类号： G03F7/70266 , G02B3/12 , G02B13/143 , G02B27/0068 , G03F7/70883 , G03F7/70958
摘要： A projection objective of a microlithographic projection exposure apparatus has a correction device which can correct photoinduced imaging errors without optical elements having to be removed for this purpose. The correction device includes a first optical element and a second optical element, whose surface facing the first optical element is provided with a local surface deformation for improving the imaging properties of the projection objective. In a wall, which seals an intermediate space formed between the first optical element and the second optical element, an opening is provided through which the intermediate space can be filled with a fluid. By modifying the refractive index of the fluid adjacent to the surface, the effect of the surface deformation can be modified in a straightforward way.
摘要翻译： 微光刻投影曝光装置的投影物镜具有校正装置，该校正装置可以校正光诱导的成像误差，而不需要为此而移除光学元件。 校正装置包括第一光学元件和第二光学元件，其面向第一光学元件的表面设置有用于改善投影物镜的成像特性的局部表面变形。 在密封形成在第一光学元件和第二光学元件之间的中间空间的壁中，设置有可以用流体填充中间空间的开口。 通过改变与表面相邻的流体的折射率，可以以直接的方式修改表面变形的影响。
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公开(公告)号：US20050219707A1
公开(公告)日：2005-10-06
申请号：US11097398
申请日：2005-04-01
CPC分类号： G03F7/70266 , G02B3/12 , G02B13/143 , G02B27/0068 , G03F7/70883 , G03F7/70958
摘要： A projection objective of a microlithographic projection exposure apparatus has a correction device which can correct photoinduced imaging errors without optical elements having to be removed for this purpose. The correction device includes a first optical element and a second optical element, whose surface facing the first optical element is provided with a local surface deformation for improving the imaging properties of the projection objective. In a wall, which seals an intermediate space formed between the first optical element and the second optical element, an opening is provided through which the intermediate space can be filled with a fluid. By modifying the refractive index of the fluid adjacent to the surface, the effect of the surface deformation can be modified in a straightforward way.
摘要翻译： 微光刻投影曝光装置的投影物镜具有校正装置，该校正装置可以校正光诱导的成像误差，而不需要为此而移除光学元件。 校正装置包括第一光学元件和第二光学元件，其面向第一光学元件的表面设置有用于改善投影物镜的成像特性的局部表面变形。 在密封形成在第一光学元件和第二光学元件之间的中间空间的壁中，设置有可以用流体填充中间空间的开口。 通过改变与表面相邻的流体的折射率，可以以直接的方式修改表面变形的影响。
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9.发明授权Lithography lens system and projection exposure system provided with at least one lithography lens system of this type 有权具有这种类型的至少一个光刻透镜系统的光刻透镜系统和投影曝光系统公开(公告)号：US07551361B2
公开(公告)日：2009-06-23
申请号：US10571267
申请日：2004-07-14
申请人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
发明人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
IPC分类号： G02B3/00
CPC分类号： G03F7/70066 , G03F7/70241
摘要： An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.
摘要翻译： 用于微光刻投影曝光系统的光学成像系统用于将布置在成像系统的物体平面中的物体场成像为布置在成像系统的图像平面中的图像场。 特别是可以涉及在照明系统中使用的投影物镜或中继物镜。 成像系统具有布置在物平面和图像平面之间的多个透镜，并且在每种情况下具有第一透镜表面和第二透镜表面。 至少一个透镜是双非球面透镜，其中第一透镜表面和第二透镜表面是非球面。 对于具有可接受的关于透镜表面的表面处理和测试的费用的双非球面透镜的情况，可以产生具有非常强的变形非球面作用的良好质量的透镜。
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公开(公告)号：USRE41350E1
公开(公告)日：2010-05-25
申请号：US11183303
申请日：2005-07-15
申请人： David R. Shafer , Alois Herkommer , Karl-Heinz Schuster , Gerd Füerter , Rudolph Von Büenau , Wilhelm Ulrich
发明人： David R. Shafer , Alois Herkommer , Karl-Heinz Schuster , Gerd Füerter , Rudolph Von Büenau , Wilhelm Ulrich
IPC分类号： G02B17/00
CPC分类号： G02B17/0892 , G02B17/0812 , G03F7/70225 , G03F7/70275
摘要： An objective comprising axial symmetry, at least one curved mirror and at least one lens and two intermediate images. The objective includes two refractive partial objectives and one catadioptric partial objective. The objective includes a first partial objective, a first intermediate a image, a second partial objective, a second intermediate image, and a third partial objective. At least one of the partial objectives is purely refractive. One of the partial objectives is purely refractive and one is purely catoptric.
摘要翻译： 包括轴向对称的目标，至少一个曲面镜和至少一个透镜和两个中间图像。 目标包括两个折射部分目标和一个反射折射部分目标。 目标包括第一部分目标，第一中间图像，第二部分目标，第二中间图像和第三部分目标。 部分目标中的至少一个纯粹是折射的。 其中一个部分目标是纯粹的折射，一个纯粹是反射的。
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