公开(公告)号：US20150072460A1

公开(公告)日：2015-03-12

申请号：US14487805

申请日：2014-09-16

Applicant: SAINT-GOBAIN GLASS FRANCE

Inventor： Joerg PALM ,  Stephan POHLNER ,  Stefan JOST ,  Thomas HAPP

IPC: H01L31/18

CPC classification number: H01L31/18 ,  C23C14/0617 ,  C23C14/0623 ,  C23C14/54 ,  C23C14/564 ,  C23C16/4412 ,  C30B23/005 ,  C30B29/48

Abstract: The invention relates to a device for depositing a layer made of at least two components on an object, with a deposition chamber for disposing the object, at least one source with material to be deposited, as well as at least one device for controlling the deposition process, implemented such that the concentration of at least one component of the material to be deposited can be modified in its gas phase prior to deposition on the substrate by selective binding of a specified quantity of the at least one component, wherein the selectively bound quantity of the at least one component can be controlled by modifying at least one control parameter that is actively coupled to a binding rate or the component. It further relates to a device for depositing a layer made of at least two components on an object, wherein a device for controlling the deposition process has at least one gettering element made of a reactive material, wherein the reactive material includes copper and/or molybdenum. It further relates to a method for depositing a layer made of at least two components on an object, wherein a selectively bound quantity of at least one component is controlled by modifying a binding rate of a device for controlling the deposition process.

Abstract translation: 本发明涉及一种用于在物体上沉积由至少两个部件构成的层的装置，其中沉积室用于设置物体，至少一个源与待沉积的材料以及至少一个用于控制沉积物的装置 方法，使得待沉积的材料的至少一种组分的浓度可以在通过选择性结合指定量的至少一种组分沉积到衬底上之前在其气相中改性，其中选择性结合量 可以通过修改主动耦合到绑定速率或组件的至少一个控制参数来控制至少一个组件。 它还涉及一种用于在物体上沉积由至少两个组分制成的层的装置，其中用于控制沉积工艺的装置具有至少一个由反应性材料制成的吸气元件，其中反应性材料包括铜和/或钼 。 它还涉及一种用于在物体上沉积由至少两种组分制成的层的方法，其中通过改变用于控制沉积工艺的装置的结合速率来控制选择性结合量的至少一种组分。