DEVICE AND METHOD FOR PRECIPITATING A LAYER ON A SUBSTRATE
    1.
    发明申请
    DEVICE AND METHOD FOR PRECIPITATING A LAYER ON A SUBSTRATE 有权
    用于在基板上预处理层的装置和方法

    公开(公告)号:US20150072460A1

    公开(公告)日:2015-03-12

    申请号:US14487805

    申请日:2014-09-16

    Abstract: The invention relates to a device for depositing a layer made of at least two components on an object, with a deposition chamber for disposing the object, at least one source with material to be deposited, as well as at least one device for controlling the deposition process, implemented such that the concentration of at least one component of the material to be deposited can be modified in its gas phase prior to deposition on the substrate by selective binding of a specified quantity of the at least one component, wherein the selectively bound quantity of the at least one component can be controlled by modifying at least one control parameter that is actively coupled to a binding rate or the component. It further relates to a device for depositing a layer made of at least two components on an object, wherein a device for controlling the deposition process has at least one gettering element made of a reactive material, wherein the reactive material includes copper and/or molybdenum. It further relates to a method for depositing a layer made of at least two components on an object, wherein a selectively bound quantity of at least one component is controlled by modifying a binding rate of a device for controlling the deposition process.

    Abstract translation: 本发明涉及一种用于在物体上沉积由至少两个部件构成的层的装置,其中沉积室用于设置物体,至少一个源与待沉积的材料以及至少一个用于控制沉积物的装置 方法,使得待沉积的材料的至少一种组分的浓度可以在通过选择性结合指定量的至少一种组分沉积到衬底上之前在其气相中改性,其中选择性结合量 可以通过修改主动耦合到绑定速率或组件的至少一个控制参数来控制至少一个组件。 它还涉及一种用于在物体上沉积由至少两个组分制成的层的装置,其中用于控制沉积工艺的装置具有至少一个由反应性材料制成的吸气元件,其中反应性材料包括铜和/或钼 。 它还涉及一种用于在物体上沉积由至少两种组分制成的层的方法,其中通过改变用于控制沉积工艺的装置的结合速率来控制选择性结合量的至少一种组分。

    LAYER SYSTEM FOR THIN-FILM SOLAR CELLS
    3.
    发明申请
    LAYER SYSTEM FOR THIN-FILM SOLAR CELLS 审中-公开
    薄膜太阳能电池层系统

    公开(公告)号:US20160233360A1

    公开(公告)日:2016-08-11

    申请号:US14409653

    申请日:2013-06-19

    Abstract: The present invention relates to a layer system (1) for thin-film solar cells (100) and solar modules, comprising an absorber layer (4), which includes a chalcogenide compound semiconductor, and a buffer layer (5), which is arranged on the absorber layer (4) and includes halogen-enriched ZnxIn1-xSy with 0.01≦x≦0.9 and 1≦y≦2, wherein the buffer layer (5) consists of a first layer region (5.1) adjoining the absorber layer (4) with a halogen mole fraction A1 and a second layer region (5.2) adjoining the first layer region (5.1) with a halogen mole fraction A2 and the ratio A1/A2 is ≧2 and the layer thickness (d1) of the first layer region (5.1) is ≦50% of the layer thickness (d) of the buffer layer (5).

    Abstract translation: 本发明涉及一种用于薄膜太阳能电池(100)的层系统(1)和太阳能模块,其包括含有硫族化合物半导体的吸收层(4)和缓冲层(5) 在吸收层(4)上,并且包括具有0.01≤x≤0.9且1≤y≤2的富含卤素的Zn x In 1-x S y,其中缓冲层(5)由与吸收层(4)相邻的第一层区域 )与卤素摩尔分数A1和邻接第一层区域(5.1)的第二层区域(5.2)与卤素摩尔分数A2比较,并且比率A1 / A2为≥2,第一层区域的层厚度(d1) (5.1)为缓冲层(5)的层厚度(d)的50%。

    LAYER SYSTEM FOR THIN-FILM SOLAR CELLS
    4.
    发明申请
    LAYER SYSTEM FOR THIN-FILM SOLAR CELLS 审中-公开
    薄膜太阳能电池层系统

    公开(公告)号:US20150325722A1

    公开(公告)日:2015-11-12

    申请号:US14409684

    申请日:2013-06-19

    Abstract: The present invention relates to a layer system (1) for thin-film solar cells (100) and solar modules, comprising an absorber layer (4) that includes a chalcogenide compound semiconductor and a buffer layer (5) that is arranged on the absorber layer (4) and includes halogen-enriched InxSy with ⅔≦x/y≦1, wherein the buffer layer (5) consists of a first layer region (5.1) adjoining the absorber layer (4) with a halogen mole fraction A1 and a second layer region (5.2) adjoining the first layer region (5.1) with a halogen mole fraction A2 and the ratio A1/A2 is ≧2 and the layer thickness (d1) of the first layer region (5.1) is ≦50% of the layer thickness (d) of the buffer layer (5).

    Abstract translation: 本发明涉及一种用于薄膜太阳能电池(100)和太阳能模块的层系统(1),包括一个吸收层(4),该吸收层包括一个硫族化物化合物半导体和一个缓冲层(5) 层(4),并且包括具有⅔和nlE的卤素富集的In x S y; x / y&n l E; 1,其中缓冲层(5)由邻近吸收层(4)的第一层区域(5.1)和卤素摩尔分数A1组成, 与第一层区域(5.1)邻接的第二层区域(5.2)与卤素摩尔分数A2,比率A1 / A2为≥2,第一层区域(5.1)的层厚度(d1)为 缓冲层(5)的层厚度(d)。

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