METHOD FOR PRODUCING A COMPOUND SEMICONDUCTOR, AND THIN-FILM SOLAR CELL
    3.
    发明申请
    METHOD FOR PRODUCING A COMPOUND SEMICONDUCTOR, AND THIN-FILM SOLAR CELL 有权
    用于生产化合物半导体和薄膜太阳能电池的方法

    公开(公告)号:US20150318433A1

    公开(公告)日:2015-11-05

    申请号:US14651374

    申请日:2013-12-11

    Abstract: The present invention relates to a method for producing a compound semiconductor (2), which comprises the following steps: Producing at least one precursor layer stack (11), consisting of a first precursor layer (5.1), a second precursor layer (6), and a third precursor layer (5.2), wherein, in a first stage, the first precursor layer (5.1) is produced by depositing the metals copper, indium, and gallium onto a body (12), and, in a second stage, the second precursor layer (6) is produced by depositing at least one chalcogen, selected from sulfur and selenium, onto the first precursor layer (5.1) and, in a third stage, the third precursor layer (5.2) is produced by depositing the metals copper, indium, and gallium onto the second precursor layer (6); Heat treating the at least one precursor layer stack (11) in a process chamber (13) such that the metals of the first precursor layer (5.1), the at least one chalcogen of the second precursor layer (6), and the metals of the third precursor layer (5.2) are reactively converted to form the compound semiconductor (2).

    Abstract translation: 本发明涉及一种制备化合物半导体(2)的方法,包括以下步骤:制备至少一个由第一前体层(5.1),第二前体层(6)组成的前体层叠层(11) 和第三前体层(5.2),其中在第一阶段中,通过将金属铜,铟和镓沉积到主体(12)上而制备第一前体层(5.1),并且在第二阶段中, 通过将至少一种选自硫和硒的硫属元素沉积到第一前体层(5.1)上而制备第二前体层(6),并且在第三阶段通过沉积金属制备第三前体层(5.2) 铜,铟和镓到第二前体层(6)上; 在处理室(13)中热处理所述至少一个前体层叠层(11),使得第一前体层(5.1)的金属,第二前体层(6)的至少一个硫属元素和金属 第三前体层(5.2)被反应转化以形成化合物半导体(2)。

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