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公开(公告)号：US09040330B2
公开(公告)日：2015-05-26
申请号：US14015946
申请日：2013-08-30
发明人： Myong-Hwan Choi , Woon-Hyun Choi , Kyoung-Won Oh
IPC分类号： H01L27/32
CPC分类号： H01L27/3272 , C23C14/042 , H01L51/0011 , H01L51/56
摘要： A deposition apparatus includes (i) a sheet including a slit area, first and second dummy slit areas, and a binding area; and (ii) a frame. The slit area has a plurality of patterning slits that are extended along a first direction and arranged along a second direction crossing the first direction. The first and second dummy slit areas are outside the slit area along the second direction and along the opposite direction to the second direction respectively and have a plurality of dummy slits. The binding area surrounds the slit area and the first and second dummy slit areas. The frame is attached to the binding area of the sheet and shields at least some of the plurality of dummy slits of the first and second dummy slit areas.
摘要翻译： 沉积设备包括（i）包括狭缝区域，第一和第二虚拟狭缝区域和结合区域的片材; 和（ii）框架。 狭缝区域具有沿着第一方向延伸并沿着与第一方向交叉的第二方向布置的多个构图缝隙。 第一和第二虚拟狭缝区域沿着第二方向和沿着与第二方向相反的方向在狭缝区域的外侧，并且具有多个虚拟狭缝。 装订区域围绕狭缝区域和第一和第二虚拟狭缝区域。 框架附接到片材的装订区域并屏蔽第一和第二虚拟狭缝区域的多个虚拟狭缝中的至少一些。
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2.发明授权公开(公告)号：US08993360B2
公开(公告)日：2015-03-31
申请号：US13951374
申请日：2013-07-25
发明人： Woon-Hyun Choi , Kyung-Han Kim , Myong-Hwan Choi , Kyoung-Won Oh
CPC分类号： H01L51/0011 , C23C14/042 , C23C14/243 , H01L27/3211
摘要： A deposition apparatus for depositing a deposition material on a substrate in order to improve characteristics of a deposition layer includes: a deposition source facing the substrate and ejecting the deposition material; a patterning slit sheet including patterning slits for depositing the deposition material in a desired pattern and disposed to face the substrate; a frame coupled to the patterning slit sheet; and a stage bonded to the frame to support the frame, wherein a separation area is formed between the frame and the stage.
摘要翻译： 用于在基板上沉积沉积材料以便改善沉积层的特性的沉积装置包括：沉积源，其面向基板并喷射沉积材料; 图案化缝隙片，包括用于将所述沉积材料沉积成所需图案并且设置为面对所述衬底的图案化缝隙; 耦合到所述图案化缝隙片的框架; 以及阶段，其结合到框架以支撑框架，其中在框架和台架之间形成分离区域。
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3.发明申请Organic Layer Deposition Apparatus, Frame Sheet Assembly For The Organic Layer Deposition Apparatus, And Method Of Manufacturing Organic Light Emitting Display Device Using The Frame Sheet Assembly 审中-公开有机层沉积装置，用于有机层沉积装置的框架板组件和使用框架组件制造有机发光显示装置的方法公开(公告)号：US20150217319A1
公开(公告)日：2015-08-06
申请号：US14691490
申请日：2015-04-20
发明人： Myong-Hwan Choi , Sung-Bong Lee , Myung-Ki Lee , Mu-Hyun Kim
CPC分类号： B05B1/20 , B05B7/1686 , C23C14/042 , C23C14/12 , C23C14/24 , C23C14/243 , H01L51/56
摘要： An organic layer deposition apparatus capable of protecting or preventing a patterning slit sheet from sagging, and a frame sheet assembly for the organic layer deposition apparatus.
摘要翻译： 一种能够保护或防止图案化狭缝片下垂的有机层沉积装置和用于有机层沉积装置的框架片组件。
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4.发明申请公开(公告)号：US20140203264A1
公开(公告)日：2014-07-24
申请号：US14222472
申请日：2014-03-21
发明人： Sung-Bong Lee , Myung-Ki Lee , Myong-Hwan Choi , Mu-Hyun Kim
CPC分类号： H01L51/5203 , C23C14/042 , H01L51/0011 , H01L51/56
摘要： A patterning slit sheet assembly for performing a deposition process to form a thin film on a substrate in a desired fine pattern. The patterning slit sheet assembly includes a patterning slit sheet having a plurality of slits, a frame combined with the patterning slit sheet to support the patterning slit sheet, and a support unit including an upper member that is allowed to be moved or fixed to support the patterning slit sheet when a gravitational force is applied to the patterning slit sheet and a lower member disposed more apart from the patterning slit sheet than the upper member, wherein the upper member is fixed on the lower member.
摘要翻译： 一种图案化缝隙片组件，用于执行沉积工艺以在所需的精细图案中在衬底上形成薄膜。 图形化缝隙片组件包括具有多个狭缝的图案化缝隙片，与图案化缝隙片组合以支撑图案化缝隙片的框架，以及支撑单元，其包括允许移动或固定以支撑图案化缝隙片的上部构件 当向图案化缝隙片施加重力时构图缝隙片和与图案化缝隙片比上部构件更远离的下部构件，其中上部构件固定在下部构件上。
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5.发明申请DEPOSITION APPARATUS, METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY APPARATUS, AND ORGANIC LIGHT EMITTING DISPLAY APPARATUS 审中-公开沉积装置，制造有机发光显示装置的方法和有机发光显示装置公开(公告)号：US20150207108A1
公开(公告)日：2015-07-23
申请号：US14671718
申请日：2015-03-27
发明人： Woon-Hyun Choi , Kyung-Han Kim , Myong-Hwan Choi , Kyoung-Won Oh
IPC分类号： H01L51/56
CPC分类号： C23C14/042 , C23C14/243 , H01L27/3211 , H01L51/0011
摘要： A deposition apparatus for depositing a deposition material on a substrate in order to improve characteristics of a deposition layer includes: a deposition source facing the substrate and ejecting the deposition material; a patterning slit sheet including patterning slits for depositing the deposition material in a desired pattern and disposed to face the substrate; a frame coupled to the patterning slit sheet; and a stage bonded to the frame to support the frame, wherein a separation area is formed between the frame and the stage.
摘要翻译： 用于在基板上沉积沉积材料以便改善沉积层的特性的沉积装置包括：沉积源，其面向基板并喷射沉积材料; 图案化缝隙片，包括用于将所述沉积材料沉积成所需图案并且设置为面对所述衬底的图案化缝隙; 耦合到所述图案化缝隙片的框架; 以及阶段，其结合到框架以支撑框架，其中在框架和台架之间形成分离区域。
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6.发明授权公开(公告)号：US09076982B2
公开(公告)日：2015-07-07
申请号：US14222472
申请日：2014-03-21
发明人： Sung-Bong Lee , Myung-Ki Lee , Myong-Hwan Choi , Mu-Hyun Kim
CPC分类号： H01L51/5203 , C23C14/042 , H01L51/0011 , H01L51/56
摘要： A patterning slit sheet assembly for performing a deposition process to form a thin film on a substrate in a desired fine pattern. The patterning slit sheet assembly includes a patterning slit sheet having a plurality of slits, a frame combined with the patterning slit sheet to support the patterning slit sheet, and a support unit including an upper member that is allowed to be moved or fixed to support the patterning slit sheet when a gravitational force is applied to the patterning slit sheet and a lower member disposed more apart from the patterning slit sheet than the upper member, wherein the upper member is fixed on the lower member.
摘要翻译： 一种图案化缝隙片组件，用于执行沉积工艺以在所需的精细图案中在衬底上形成薄膜。 图形化缝隙片组件包括具有多个狭缝的图案化缝隙片，与图案化缝隙片组合以支撑图案化缝隙片的框架，以及支撑单元，其包括允许移动或固定以支撑图案化缝隙片的上部构件 当向图案化缝隙片施加重力时构图缝隙片和与图案化缝隙片比上部构件更远离的下部构件，其中上部构件固定在下部构件上。
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7.发明申请公开(公告)号：US20140312318A1
公开(公告)日：2014-10-23
申请号：US14015946
申请日：2013-08-30
发明人： Myong-Hwan Choi , Woon-Hyun Choi , Kyoung-Won Oh
IPC分类号： H01L27/32
CPC分类号： H01L27/3272 , C23C14/042 , H01L51/0011 , H01L51/56
摘要： A deposition apparatus includes (i) a sheet including a slit area, first and second dummy slit areas, and a binding area; and (ii) a frame. The slit area has a plurality of patterning slits that are extended along a first direction and arranged along a second direction crossing the first direction. The first and second dummy slit areas are outside the slit area along the second direction and along the opposite direction to the second direction respectively and have a plurality of dummy slits. The binding area surrounds the slit area and the first and second dummy slit areas. The frame is attached to the binding area of the sheet and shields at least some of the plurality of dummy slits of the first and second dummy slit areas.
摘要翻译： 沉积设备包括（i）包括狭缝区域，第一和第二虚拟狭缝区域和结合区域的片材; 和（ii）框架。 狭缝区域具有沿着第一方向延伸并沿着与第一方向交叉的第二方向布置的多个构图缝隙。 第一和第二虚拟狭缝区域沿着第二方向和沿着与第二方向相反的方向在狭缝区域的外侧，并且具有多个虚拟狭缝。 装订区域围绕狭缝区域和第一和第二虚拟狭缝区域。 框架附接到片材的装订区域并屏蔽第一和第二虚拟狭缝区域的多个虚拟狭缝中的至少一些。
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8.发明申请公开(公告)号：US20140291620A1
公开(公告)日：2014-10-02
申请号：US13951374
申请日：2013-07-25
发明人： Woon-Hyun Choi , Kyung-Han Kim , Myong-Hwan Choi , Kyoung-Won Oh
CPC分类号： H01L51/0011 , C23C14/042 , C23C14/243 , H01L27/3211
摘要： A deposition apparatus for depositing a deposition material on a substrate in order to improve characteristics of a deposition layer includes: a deposition source facing the substrate and ejecting the deposition material; a patterning slit sheet including patterning slits for depositing the deposition material in a desired pattern and disposed to face the substrate; a frame coupled to the patterning slit sheet; and a stage bonded to the frame to support the frame, wherein a separation area is formed between the frame and the stage.
摘要翻译： 用于在基板上沉积沉积材料以便改善沉积层的特性的沉积装置包括：沉积源，其面向基板并喷射沉积材料; 图案化缝隙片，包括用于将所述沉积材料沉积成所需图案并且设置为面对所述衬底的图案化缝隙; 耦合到所述图案化缝隙片的框架; 以及阶段，其结合到框架以支撑框架，其中在框架和台架之间形成分离区域。
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