公开(公告)号：US20160322399A1

公开(公告)日：2016-11-03

申请号：US15004392

申请日：2016-01-22

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： DUK-SUNG KIM ,  SHIN IL CHOI ,  SU BIN BAE ,  YU-GWANG JEONG

IPC: H01L27/12 ,  G02F1/1335 ,  G02F1/1362 ,  G02F1/1368

CPC classification number: H01L27/1259 ,  G02F1/1333 ,  G02F1/133345 ,  G02F1/133516 ,  G02F1/134309 ,  G02F1/136227 ,  G02F1/136286 ,  G02F2001/134372 ,  G02F2001/136222 ,  H01L27/1237 ,  H01L27/124 ,  H01L27/1248 ,  H01L27/1262

Abstract: A manufacturing method includes forming a gate member and a common electrode line on a substrate. A gate insulating layer is formed on the gate member and the common electrode line. A semiconductor member and a data member are formed on the gate insulating layer. A first passivation layer is formed on the semiconductor member and the data member. A plurality of color filters is formed on the first passivation layer. A conductor layer and a second passivation layer are formed on the plurality of color filters. A first contact hole exposes a common electrode. A second contact hole exposes the drain electrode. The first and second contact holes are formed by a photolithography process. A pixel electrode connected to the drain electrode is formed through the first contact hole. A connecting member connected to the common electrode line and the common electrode is formed through the second contact hole.

Abstract translation: 制造方法包括在基板上形成栅极部件和公共电极线。 在栅极部件和公共电极线上形成栅极绝缘层。 半导体部件和数据部件形成在栅极绝缘层上。 第一钝化层形成在半导体部件和数据部件上。 在第一钝化层上形成多个滤色器。 导体层和第二钝化层形成在多个滤色器上。 第一接触孔暴露公共电极。 第二接触孔露出漏电极。 第一和第二接触孔通过光刻工艺形成。 连接到漏电极的像素电极通过第一接触孔形成。 连接到公共电极线和公共电极的连接构件通过第二接触孔形成。