Method and device for measuring critical dimension of nanostructure
    8.
    发明授权
    Method and device for measuring critical dimension of nanostructure 有权
    用于测量纳米结构临界尺寸的方法和装置

    公开(公告)号:US09400254B2

    公开(公告)日:2016-07-26

    申请号:US14669536

    申请日:2015-03-26

    Abstract: Provided are a method and device for measuring a critical dimension of a nanostructure. The method includes acquiring a reference intensity distribution, in each of a number of spectral bands, of light scattered by at least one reference nanostructure, for each of a number at different positions of the at least one reference nano structure disposed along an optical axis; generating a library of reference intensity distribution arrays based on a number of the reference intensity distributions, determining an intensity distribution of light scattered by a nanostructure under investigation, for each of the number of spectral bands, at each of the number of different positions of the nanostructure under investigation disposed along the optical axis; generating an intensity distribution array by using the determined intensity distributions, and determining information about a critical dimension of the nanostructure under investigation by comparing the intensity distribution array with the library of reference intensity distribution arrays.

    Abstract translation: 提供了一种用于测量纳米结构的临界尺寸的方法和装置。 该方法包括在沿着光轴布置的至少一个参考纳米结构的不同位置处的数量中的每一个处获取在多个光谱带中的每一个中由至少一个参考纳米结构散射的光的参考强度分布; 基于多个参考强度分布生成参考强度分布阵列库,确定由所研究的纳米结构散射的光的光强分布,对于每个数量的光谱带,在每个所述多个光谱带的不同位置的数量 正在研究的纳米结构沿着光轴布置; 通过使用确定的强度分布来产生强度分布阵列,并且通过将强度分布阵列与参考强度分布阵列的库进行比较来确定关于正在研究的纳米结构的临界尺寸的信息。

    Optical measuring system and method of measuring critical size
    9.
    发明授权
    Optical measuring system and method of measuring critical size 有权
    光学测量系统及临界尺寸测量方法

    公开(公告)号:US09322640B2

    公开(公告)日:2016-04-26

    申请号:US13961305

    申请日:2013-08-07

    CPC classification number: G01B11/02 G01B2210/56

    Abstract: Optical measuring systems for measuring geometrical parameters of nano-objects and methods of measuring a critical size (CS) are provided. The optical method of measuring the CS includes selecting parameters of an optic scheme and an illumination condition; recording a set of nanostructure images corresponding to various wavelengths with various defocusing levels of scattered radiation; calculating a plurality of sets of images of a nanostructure with various defocusing levels, corresponding to various wavelengths of the scattered radiation with CS values within a known range; and comparing a set of measured images of the nanostructure with the sets of the calculated images and determining a best approximate value of the CS values.

    Abstract translation: 提供了用于测量纳米物体几何参数的光学测量系统和测量临界尺寸(CS)的方法。 测量CS的光学方法包括选择光学方案的参数和照明条件; 记录对应于各种波长的一组纳米结构图像,其具有各种散焦辐射的散焦水平; 计算具有各种散焦水平的纳米结构的多组图像,对应于具有CS值在已知范围内的散射辐射的各种波长; 以及将纳米结构的一组测量图像与所计算的图像的集合进行比较,并确定CS值的最佳近似值。

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