公开(公告)号：US20240153883A1

公开(公告)日：2024-05-09

申请号：US18387729

申请日：2023-11-07

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Seunghoon HAN ,  Doowon KWON ,  Taeyeong KIM ,  Minho JANG ,  Sohye CHO ,  Haesung KIM ,  Hyeonsoo PARK

IPC分类号： H01L23/544 ,  H01L21/66

CPC分类号： H01L23/544 ,  H01L22/12 ,  H01L2223/54426

摘要： Provided is a device including a substrate and an overlay target structure provided on the substrate, the overlay target structure includes a first alignment key having a plurality of line masks having a first width and arranged at a first pitch, a second alignment key having a plurality of line masks having a second width and arranged at a second pitch, and a nanostructure layer arranged between the first alignment key and the second alignment key, and including a plurality of nanostructures having widths less than or equal to the first width and the second width, and arranged at a pitch less than the first pitch and the second pitch.

公开(公告)号：US20150371855A1

公开(公告)日：2015-12-24

申请号：US14721395

申请日：2015-05-26

申请人： Samsung Electronics Co., Ltd.

发明人： Kiyeon YANG ,  Namjeong KIM ,  Haesung KIM

IPC分类号： H01L21/04 ,  H01L21/67 ,  H01L29/16 ,  H01L21/306 ,  H01L21/3065

CPC分类号： H01L21/042 ,  H01L21/30604 ,  H01L21/3065 ,  H01L21/67069 ,  H01L21/6708 ,  H01L21/67115 ,  H01L29/1606 ,  H01L29/66015

摘要： According to example embodiments, an apparatus for etching a two-dimensional material layer includes a stage configured to support an etching target including graphene on the stage, a light source configured to emit light having a wavelength that is shorter than a wavelength of visible light, a mask imprinted with a pattern for transferred onto the etching target, a fluid inlet configured to supply a fluid over the etching target, and a fluid outlet configured to absorb a residue and a reaction product after the fluid is supplied over the etching target using the fluid inlet.

摘要翻译： 根据示例性实施例，用于蚀刻二维材料层的设备包括：被配置为在舞台上支撑包括石墨烯的蚀刻靶的台，被配置为发射波长比可见光波长短的光的光源， 用于转印到蚀刻靶上的图案的掩模，被配置为在蚀刻对象上提供流体的流体入口和构造成吸收残留物的流体出口和在使用 流体入口。

公开(公告)号：US20230144948A1

公开(公告)日：2023-05-11

申请号：US17726064

申请日：2022-04-21

申请人： Samsung Electronics Co., Ltd.

发明人： Youngchul LEEM ,  Jeongyub LEE ,  Haesung KIM

IPC分类号： G02B1/00

CPC分类号： G02B1/005

摘要： An optical device forms a refractive index distribution for exhibiting a certain phase delay profile with respect to light in a visible light wavelength, and includes a nanopattern layer including a crystalline compound having a refractive index greater than 3 with respect to the light in the visible light wavelength band and a height equal to or less than 2 μm. The nanopattern layer may include the crystalline compound grown according to a selective epitaxial growth method, and accordingly, may have a height beneficial for a manufacturing process. Thus, the efficiency of the optical device may be improved.

公开(公告)号：US20190087044A1

公开(公告)日：2019-03-21

申请号：US16134471

申请日：2018-09-18

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Eunhyoung CHO ,  Bonwon KOO ,  Hyunjoon KIM ,  Haesung KIM ,  Jungyun WON

IPC分类号： G06F3/041 ,  H01L27/32 ,  G06F3/044 ,  G06K9/00

CPC分类号： G06F3/0412 ,  G06F3/044 ,  G06K9/0002 ,  H01L27/323 ,  H01L27/3234 ,  H01L27/3244

摘要： Provided are a pattern structure for preventing a moiré pattern from becoming visible, and a display apparatus using the same. The pattern structure includes a first element pattern including a plurality of first elements arranged regularly at a first pitch; a second element pattern including a plurality of second elements arranged regularly at a second pitch, the second element pattern being provided on the first element pattern; and a filling layer configured to fill gaps among the plurality of second elements, between adjacent ones thereof. A difference between transmittances of the second element and the filling layer is about 5% or less and thus, a moiré pattern occurring due to the overlapping of the first element pattern and the second element pattern may be prevented from becoming visible.