公开(公告)号：US20230317439A1

公开(公告)日：2023-10-05

申请号：US18203864

申请日：2023-05-31

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Meehyun LIM ,  Sungyeol KIM ,  Taekjin KIM ,  Minsung KIM ,  Hosun YOO

IPC: H01J37/32 ,  G02F1/035

CPC classification number: H01J37/32935 ,  G02F1/035 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32642 ,  H01J2237/334

Abstract: An apparatus for monitoring a plasma process may include an electro-optical (EO) sensor module and an optical guide, the EO sensor module may be arranged in a plasma chamber configured to perform a semiconductor process for processing a substrate using plasma, the EO sensor module may include a non-conductive material having an optical refractive index changed by an electric field formed in the plasma chamber, the optical guide may form at least one internal path of a light, which may have an optical characteristic changed by the changed optical refractive index, between the EO sensor module and the plasma chamber.