LOGIC DEVICE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20240275387A1

    公开(公告)日:2024-08-15

    申请号:US18234517

    申请日:2023-08-16

    CPC classification number: H03K19/08

    Abstract: A logic device includes a substrate; at least one first insulating layer on the substrate; a second insulating layer on the at least one first insulating layer; and a capacitor portion in the at least one first insulating layer and the second insulating layer, wherein the at least one first insulating layer includes a plurality of through-holes, the capacitor portion includes a capacitor structure including a lower electrode, a dielectric film, and an upper electrode, and the capacitor structure continuously extends along the inside of the plurality of through-holes and along an upper surface of the at least one first insulating layer around the plurality of through-holes.

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