公开(公告)号：US20240076550A1

公开(公告)日：2024-03-07

申请号：US18333154

申请日：2023-06-12

Applicant: Samsung Electronics Co., Ltd. ,  FOOSUNG CO., LTD.

Inventor： Hyeunwoong HONG ,  Woohyeop KWON ,  Hyeongeun AHN ,  Wooin JUNG ,  Dongkyeong KANG ,  Donghyun KIM ,  Taeheon KIM ,  Hyunjeong KIM ,  Changsu LEE ,  Kangyeob JEON ,  Jungheun MOON ,  Chulhwan MOON ,  Byungwon WOO ,  Jungeun LEE ,  Junhee LEE ,  Hyejeong JEONG ,  Taeseok LEE ,  Kangsan HONG ,  Soonkil JOUNG

IPC: C09K13/08 ,  C03C15/00

CPC classification number: C09K13/08 ,  C03C15/00

Abstract: A composition for surface treatment includes fluorosilicic acid (H2SiF6) and hydrofluoric acid (HF), and/or a surface treatment method using the same. The composition may be used to treat (e.g., etch) a substrate such as glass or the like.

公开(公告)号：US20230194100A1

公开(公告)日：2023-06-22

申请号：US18099376

申请日：2023-01-20

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Shinkyum KIM ,  Changhyun SON ,  Hyunjeong KIM ,  Jeonghyun PARK ,  Minkyung BAE ,  Sungmin OH

IPC: F24C7/08 ,  F24C3/12

CPC classification number: F24C7/087 ,  F24C3/128 ,  F24C7/085

Abstract: An apparatus and method for cooking at a constant temperature in an oven including performing a temperature raising operation of operating at least one of at least one heater and at least one circulation fan until a temperature of a preset ratio of a set temperature is reached, continuing the operating at the set temperature for a preset period, and setting an operation level by considering a temperature of the oven at an end of a current period and a temperature of the oven at a start of the current period. The method includes performing a temperature maintaining operation of operating at least one of the at least one heater and the at least one circulation fan for one period according to the set operation level, and repeating the setting of the operation level and the temperature maintaining operation until cooking is completed.