Abstract:
Provided is a method of rinsing and drying a semiconductor device, including forming a pattern on a substrate; rinsing the substrate, where the pattern is formed, using a rinse solution; loading the substrate into a dry chamber; injecting supercritical carbon dioxide into the dry chamber such that rinse solution remaining on the pattern is diluted to have a concentration below 2 percent by weight based on a weight of the rinse solution remaining on the pattern and the supercritical carbon dioxide; and venting the supercritical carbon dioxide such that the dry chamber is maintained at atmospheric pressure to dry the substrate where the pattern is formed.
Abstract:
A method and apparatus for managing a guest room are provided. The method in which a server manages a room in a room management system including at least one terminal and a gateway includes: determining a room status; assigning a housekeeper to the room based on the room status; transmitting room information to a housekeeper terminal; and receiving and updating a housekeeping status from the housekeeper terminal.