SEMICONDUCTOR MEMORY DEVICE
    2.
    发明公开

    公开(公告)号:US20240306371A1

    公开(公告)日:2024-09-12

    申请号:US18462553

    申请日:2023-09-07

    Abstract: A semiconductor device includes a semiconductor substrate including a first semiconductor material, a gate structure on the semiconductor substrate, and a semiconductor pattern including a second semiconductor material, between the semiconductor substrate and the gate structure. The semiconductor pattern is in contact with the semiconductor substrate, the gate structure passes through a portion of the semiconductor pattern, and is spaced apart from the semiconductor substrate, and the first semiconductor material is different from the second semiconductor material.

    SEMICONDUCTOR PACKAGE AND A METHOD OF FABRICATING THE SAME

    公开(公告)号:US20210366832A1

    公开(公告)日:2021-11-25

    申请号:US17392705

    申请日:2021-08-03

    Abstract: A semiconductor package including: a first package; a second package on the first package, the second package including a second package substrate, first and second semiconductor chips on the second package substrate, and a second molding part on the second package substrate and covering the first and second semiconductor chips; and a fill part between the first package and the second package, a first through hole that penetrates the second package substrate, the first through hole being between the first and second semiconductor chips, a second through hole that penetrates the second molding part, the second through hole being connected to the first through hole, and wherein the fill part has an extension disposed in the first through hole and the second through hole.

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