公开(公告)号：US20170082921A1

公开(公告)日：2017-03-23

申请号：US15218284

申请日：2016-07-25

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jong-su KIM ,  Shuichi TAMAMUSHI ,  In-kyun SHIN ,  Sung-il LEE ,  Jin CHOI

IPC: G03F1/70 ,  G03F1/72

CPC classification number: G03F1/70 ,  G03F1/78 ,  G03F7/2059 ,  G03F7/70616 ,  G03F7/70875

Abstract: A method of manufacturing a reticle, the method including preparing a substrate, determining position data of a pattern to be formed on the substrate, and setting a primary exposure condition to form the pattern; performing a primary exposure simulation regarding the substrate based on the position data of the pattern and the primary exposure condition; calculating a primary deformation rate of the substrate, which is generated in the primary exposure simulation; correcting the position data of the pattern based on the primary deformation rate of the substrate to provide a corrected position data of the pattern; and exposing the substrate under the primary exposure condition based on the corrected position data of the pattern.