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    CONDUCTIVE PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE, AND ELECTRONIC APPARATUS
    1.
    发明申请
    CONDUCTIVE PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE, AND ELECTRONIC APPARATUS 有权
    导电图案形成方法，半导体器件和电子设备

    公开(公告)号：US20160013072A1

    公开(公告)日：2016-01-14

    申请号：US14790178

    申请日：2015-07-02

    Applicant: SEIKO EPSON CORPORATION

    Inventor： Hiroshi SERA

    IPC: H01L21/3213 ,  H01L23/532 ,  H01L21/3205

    CPC classification number: H01L21/32135 ,  G02F2001/13685 ,  H01L21/32136 ,  H01L23/53219 ,  H01L23/53223 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: There is provided a conductive pattern forming method that can suppress shape abnormalities caused by the reattachment of a neodymium component. A conductive pattern forming method according to an aspect of the invention includes forming an aluminum-neodymium alloy film on a base material; forming, on the aluminum-neodymium alloy film, a conductive film having a thickness greater than or equal to ¼ times the thickness of the aluminum-neodymium alloy film; and patterning the aluminum-neodymium alloy film and the conductive film by using dry etching.

    Abstract translation: 提供了可以抑制由钕组分重新附着引起的形状异常的导电图案形成方法。 根据本发明的一个方面的导电图案形成方法包括在基材上形成铝 - 钕合金膜; 在铝 - 钕合金膜上形成厚度大于或等于铝 - 钕合金膜厚度的1/4倍的导电膜; 并通过使用干蚀刻图案化铝 - 钕合金膜和导电膜。

    PHOTORESIST FILM PLACING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC DEVICE
    2.
    发明申请
    PHOTORESIST FILM PLACING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC DEVICE 有权
    光电隔离膜配置方法，半导体器件制造方法，电光器件和电子器件

    公开(公告)号：US20150294859A1

    公开(公告)日：2015-10-15

    申请号：US14681344

    申请日：2015-04-08

    Applicant: SEIKO EPSON CORPORATION

    Inventor： Hiroshi SERA ,  Yoshiki NAKASHIMA

    IPC: H01L21/027 ,  G03F7/40 ,  H01L21/266

    CPC classification number: H01L21/0274 ,  G03F7/0035 ,  G03F7/40

    Abstract: A method for placing a resist film of a region having a small film thickness with good shape accuracy is provided. The method has processes of placing a photoresist film 15 on a substrate body 10, exposing the photoresist film 15 using a halftone mask 30 having light transmittances of three or more tones, and developing the photoresist film 15. The photoresist film 15 after the development has a first photoresist film 16 and a second photoresist film 17 that is thicker than the first photoresist film 16. On the substrate body 10 after the development, the second photoresist film 17 is placed at a location where the second photoresist film 17 can be placed without removing the photoresist film 15.

    Abstract translation: 提供了一种用于放置具有良好形状精度的具有小膜厚的区域的抗蚀剂膜的方法。 该方法具有将光致抗蚀剂膜15放置在基板主体10上的工艺，使用具有三色或更多色调的透光度的半色调掩模30曝光光致抗蚀剂膜15，并显影光致抗蚀剂膜15.显影后的光致抗蚀剂膜15具有 第一光致抗蚀剂膜16和比第一光致抗蚀剂膜16厚的第二光致抗蚀剂膜17.在显影之后的基板主体10上，第二光致抗蚀剂膜17被放置在可以放置第二光致抗蚀剂膜17的位置，而没有 去除光致抗蚀剂膜15。

    FLUID TRANSPORT APPARATUS, METHOD FOR CONTROLLING THE SAME, AND CHEMICAL SYNTHESIS APPARATUS
    3.
    发明申请
    FLUID TRANSPORT APPARATUS, METHOD FOR CONTROLLING THE SAME, AND CHEMICAL SYNTHESIS APPARATUS 有权
    流体运输装置，其控制方法和化学合成装置

    公开(公告)号：US20160339408A1

    公开(公告)日：2016-11-24

    申请号：US15155362

    申请日：2016-05-16

    Applicant: Seiko Epson Corporation

    Inventor： Hiroshi SERA

    IPC: B01J14/00 ,  F15D1/02

    CPC classification number: F15D1/02 ,  B01J19/0093 ,  B01J2219/00783 ,  B01J2219/00813 ,  B01J2219/00817 ,  B01J2219/00891 ,  B01J2219/009 ,  B01J2219/00963

    Abstract: A fluid transport apparatus includes a pressure chamber to which a fluid is supplied, N drive elements that deliver the fluid to a channel by changing pressure of the fluid within the pressure chamber, and a control section that supplies a drive signal to each of the drive elements. The control section controls the N (N≧2) drive elements such that phases of drive signals which are supplied to each of the drive elements are different from each other. Therefore, by changing the pressure of the fluid within the pressure chamber while suppressing an amplitude of the drive elements as a whole, pulsation of the fluid is effectively suppressed.

    Abstract translation: 流体输送装置包括供给流体的压力室，通过改变压力室内的流体压力而将流体输送到通道的N个驱动元件，以及向每个驱动器提供驱动信号的控制部 元素。 控制部分控制N（N≥2）个驱动元件，使得提供给每个驱动元件的驱动信号的相位彼此不同。 因此，通过在抑制驱动元件整体的振幅的同时通过改变压力室内的流体的压力，有效地抑制流体的脉动。

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