公开(公告)号：US20140184698A1

公开(公告)日：2014-07-03

申请号：US14141039

申请日：2013-12-26

Applicant: SEIKO EPSON CORPORATION

Inventor： Kei TADACHI ,  Katsuhiro TAKAHASHI

IPC: B41J2/14

CPC classification number: B41J2/1433 ,  B41J2/055 ,  B41J2/14233 ,  B41J2/1606 ,  B41J2/1646 ,  B41J2002/14241

Abstract: A silicon nozzle plate has excellent liquid resistance on an inner surface of a nozzle opening and a discharge surface. A plurality of the nozzle openings are disposed in a silicon substrate of the nozzle plate. A tantalum oxide film formed by atomic layer deposition is disposed on both surfaces of the silicon substrate and the inner surface of the nozzle opening.

公开(公告)号：US20250033334A1

公开(公告)日：2025-01-30

申请号：US18783471

申请日：2024-07-25

Applicant: SEIKO EPSON CORPORATION

Inventor： Shogo NAKADA ,  Taiki KONO ,  Katsuhiro TAKAHASHI ,  Akihiro TOYA

IPC: B32B27/10 ,  B32B5/02 ,  B32B7/02 ,  B32B29/02 ,  B41J2/17

Abstract: A liquid-absorbing body includes: an absorbing layer having a water-absorbing resin and having liquid-absorbing ability; and a base material layer stacked on at least one surface side of the absorbing layer, the base material layer having liquid permeability, in which the base material layer has a first layer including cellulose and a second layer positioned on a side of the first layer opposite to the absorbing layer, the second layer having a basis weight different from a basis weight of the first layer, and A2