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公开(公告)号：US20200075355A1
公开(公告)日：2020-03-05
申请号：US16556025
申请日：2019-08-29
Applicant: SEMES CO., LTD.
Inventor： OH JIN KWON , CHONG-MIN RYU , YOUNG HO CHOO
Abstract: A method for treating a substrate includes a mixing step of preparing an ozone treatment fluid containing an ozone gas and a substrate treating step of treating a surface of the substrate using the ozone treatment fluid. In the substrate treating step, light is irradiated to the substrate by a lamp.
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