公开(公告)号：US20200075362A1

公开(公告)日：2020-03-05

申请号：US16557790

申请日：2019-08-30

Applicant: SEMES CO., LTD.

Inventor： OHYEOL KWON ,  JIHYUN LEE ,  YOUNG HO CHOO

IPC: H01L21/67 ,  H01L21/68 ,  H01L21/687

Abstract: The inventive concept relates to a substrate treating apparatus and method for removing various types of treating liquid or cleaning solution films on an edge region of a substrate without damage to a treated surface even though the substrate is rotated in an eccentric state.

公开(公告)号：US20200075355A1

公开(公告)日：2020-03-05

申请号：US16556025

申请日：2019-08-29

Applicant: SEMES CO., LTD.

Inventor： OH JIN KWON ,  CHONG-MIN RYU ,  YOUNG HO CHOO

IPC: H01L21/67 ,  H01L21/02

Abstract: A method for treating a substrate includes a mixing step of preparing an ozone treatment fluid containing an ozone gas and a substrate treating step of treating a surface of the substrate using the ozone treatment fluid. In the substrate treating step, light is irradiated to the substrate by a lamp.