公开(公告)号：US20240116086A1

公开(公告)日：2024-04-11

申请号：US18117524

申请日：2023-03-06

Applicant: SEMES CO., LTD.

Inventor： Yong Hyun CHOI ,  Woo Young KIM ,  Dong Gyu JIN

IPC: B08B3/08 ,  B08B3/02 ,  B08B5/00 ,  B08B7/00 ,  B08B7/04

CPC classification number: B08B3/08 ,  B08B3/02 ,  B08B5/00 ,  B08B7/0071 ,  B08B7/04 ,  B08B2220/01 ,  F26B3/06

Abstract: A substrate processing facility includes a cleaning device for cleaning a substrate; and a drying device for drying the substrate cleaned by the cleaning device with a supercritical gas, wherein the cleaning device includes a sulfuric acid cleaning chamber.