公开(公告)号：US20240203756A1

公开(公告)日：2024-06-20

申请号：US18470474

申请日：2023-09-20

Applicant: SEMES CO., LTD.

Inventor： Joon Hwan JANG ,  Jong Han KIM ,  Dong Gyu LEE

IPC: H01L21/67

CPC classification number: H01L21/67017

Abstract: The present disclosure provides an integrated exhaust duct and a substrate processing apparatus.
The integrated exhaust duct according to the present disclosure includes: an integrated duct body having a plurality of exhaust regions and an exhaust hole communicating with the plurality of exhaust regions; and a hole partition wall disposed inside the exhaust hole to divide the exhaust hole so that the plurality of exhaust regions are blocked from communicating with each other by passing through the exhaust hole.