公开(公告)号：US20240162032A1

公开(公告)日：2024-05-16

申请号：US18119870

申请日：2023-03-10

Applicant: SEMES CO., LTD.

Inventor： Si Nae SONG ,  Sung Bum PARK ,  Ho Jin JEONG ,  Dong Ho LIM

IPC: H01L21/02 ,  B08B3/02 ,  B08B3/08 ,  B08B13/00 ,  H01L21/67 ,  H01L21/687

CPC classification number: H01L21/02057 ,  B08B3/022 ,  B08B3/08 ,  B08B13/00 ,  H01L21/67051 ,  H01L21/68764

Abstract: A substrate treatment method includes an auto-recovery operation of automatically recovering a substrate when a treatment process of treating the substrate is interrupted due to an occurrence of an abnormality and a chamber neutralization operation of neutralizing an inside of a process chamber including the substrate before the auto-recovery operation after the treatment process is stopped.

公开(公告)号：US20250135510A1

公开(公告)日：2025-05-01

申请号：US18929782

申请日：2024-10-29

Applicant: SEMES CO., LTD.

Inventor： Si Nae SONG ,  Ho Jin JEONG ,  Kyung Min KIM ,  Sung Bum PARK ,  Dong Ho LIM ,  Soo Young PARK

IPC: B08B3/04 ,  B08B3/08 ,  H01L21/02

Abstract: Disclosed is a substrate treating apparatus including: a substrate support unit for supporting and rotating a substrate; a liquid supply unit for supplying a treatment solution onto the substrate; a collection cup provided to surround the substrate support unit, and having a plurality of collection spaces for collecting a treatment solution scattered from the substrate; a lifting unit for changing a relative position between the collection cup and the substrate; and a controller for controlling the lifting unit to vary a relative height between the substrate and the collection cup in accordance with a process recipe for treating the substrate.