公开(公告)号：US11840089B2

公开(公告)日：2023-12-12

申请号：US17394803

申请日：2021-08-05

Applicant: SEMES CO., LTD.

Inventor： Jae Hyun You ,  Hun Sub Lim

IPC: B41J2/165

CPC classification number: B41J2/16552 ,  B41J2/1652 ,  B41J2002/16558

Abstract: An inkjet head cleaning device includes a body; an ejection part formed in the body, and configured to eject a cleaning liquid to a nozzle surface of a head; and a suction part formed in the body, and configured to suck the cleaning liquid ejected from the ejection part and used for cleaning the nozzle surface of the head, and foreign substances separated from the nozzle surface of the head; and the ejection part includes a vertical passage through which the cleaning liquid flows and a discharge end at the end of the vertical passage and configured to guide the cleaning liquid to eject toward the suction part.

公开(公告)号：US11880099B2

公开(公告)日：2024-01-23

申请号：US17507026

申请日：2021-10-21

Applicant: SEMES CO., LTD.

Inventor： Seon Beom Kim ,  Hun Sub Lim

IPC: G02F1/13 ,  G02F1/1333

CPC classification number: G02F1/1303 ,  G02F1/133308

Abstract: Embodiments of the inventive concept provide a substrate treating apparatus and a substrate treating method. According to an embodiment, the substrate treating apparatus may include a substrate floating unit that floats a substrate, a gripping member that grips the substrate on the substrate floating unit, a nozzle unit that is located above the substrate floating unit and discharges a treatment liquid to the substrate, and an impurity removal unit that removes impurities in the substrate floating unit.