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公开(公告)号：US20210197237A1
公开(公告)日：2021-07-01
申请号：US17138301
申请日：2020-12-30
Applicant: SEMES CO., LTD.
Inventor： Tae Suk YUN , Hyeon Suk PARK
Abstract: An apparatus for processing a substrate includes a housing having a processing space in which the substrate is processed, a support unit that supports the substrate in the processing space, a nozzle that dispenses a chemical onto the substrate placed on the support unit, a chemical supply unit that supplies the chemical to the nozzle, and a controller that controls the chemical supply unit.
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