公开(公告)号：US20210197237A1

公开(公告)日：2021-07-01

申请号：US17138301

申请日：2020-12-30

Applicant: SEMES CO., LTD.

Inventor： Tae Suk YUN ,  Hyeon Suk PARK

IPC: B08B3/08 ,  B08B3/02 ,  B08B13/00 ,  B08B3/10

Abstract: An apparatus for processing a substrate includes a housing having a processing space in which the substrate is processed, a support unit that supports the substrate in the processing space, a nozzle that dispenses a chemical onto the substrate placed on the support unit, a chemical supply unit that supplies the chemical to the nozzle, and a controller that controls the chemical supply unit.

公开(公告)号：US20230131576A1

公开(公告)日：2023-04-27

申请号：US17969155

申请日：2022-10-19

Applicant: SEMES CO., LTD.

Inventor： Do Gyeong HA ,  Tae Suk YUN ,  Moon Soon CHOI ,  Gu Yeol AN ,  Chae Young LIM ,  Bu Young JUNG

IPC: H01L21/67

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to support a substrate; and a liquid supply unit configured to supply a treating liquid onto the substrate supported on the support unit, and wherein the liquid supply unit comprises: a tank configured to have an accommodation space for storing the treating liquid therein; a circulation line configured to circulate the treating liquid stored in the accommodation space; a supplementary line configured to supply the treating liquid to the accommodation space, and at which a valve is installed; a heater installed at the circulation line, and for heating the treating liquid; and a controller is configured to control the valve and the heater.

公开(公告)号：US20140290698A1

公开(公告)日：2014-10-02

申请号：US14228512

申请日：2014-03-28

Applicant: Semes Co., Ltd.

Inventor： Tae Suk YUN ,  Byung Un KIM ,  Chang Yul CHO

IPC: B08B3/10

CPC classification number: H01L21/67253 ,  H01L21/67017 ,  H01L21/67051 ,  Y10T137/6606 ,  Y10T137/86027

Abstract: Provided is a substrate treatment apparatus including a housing, a supporting unit located inside the housing and supporting a substrate, a nozzle unit supplying chemicals to the substrate disposed on the supporting unit, and a chemical supplying unit supplying the chemicals to the nozzle unit. Herein, the chemical supplying unit includes a chemical supply source, a first tank and a second tank storing the chemicals, a chemical supplying line supplying the chemicals from the chemical supply source to the first tank and the second tank, a chemical discharge line supplying the chemicals from the first tank and the second tank to the nozzle unit, a circulation line allowing the chemicals to circulate through the first tank and the second tank, respectively, a member installed on the circulation line, and a controller controlling the member.

Abstract translation: 本发明提供一种基板处理装置，其具备壳体，位于壳体内部并支撑基板的支撑单元，向设置在支撑单元上的基板供给化学物质的喷嘴单元，以及向喷嘴单元供给化学品的化学供给单元。 这里，化学品供应单元包括化学品供应源，第一罐和储存化学品的第二罐，将化学品从化学品供应源提供给第一罐和第二罐的化学品供应管线， 从第一罐和第二罐到喷嘴单元的化学品，分别允许化学品通过第一罐和第二罐循环的循环管线，安装在循环管线上的部件和控制该部件的控制器。

公开(公告)号：US20230184574A1

公开(公告)日：2023-06-15

申请号：US18063881

申请日：2022-12-09

Applicant: SEMES CO., LTD.

Inventor： Tae Suk YUN ,  Sang Woo Park ,  Do Gyeong Ha ,  Seung Tae Yang ,  Bu Young Jung ,  Moon Soon Choi ,  Chae Young Lim

IPC: G01F23/02 ,  B05C11/10 ,  B05C5/02

CPC classification number: G01F23/02 ,  B05C11/1026 ,  B05C5/0225

Abstract: Provided is an apparatus for supplying a chemical liquid, the apparatus including: a storage tank in which a chemical liquid is stored; a discharge line through which the chemical liquid stored in the storage tank is discharged; a level tube connected to the storage tank so as to check a water level of the chemical liquid in the storage tank and receiving the chemical liquid at the same water level as the water level of the chemical liquid in the storage tank; and a controller for controlling a first valve installed in the discharge line, in which the level tube has one end connected to an upper space of the storage tank and the other end connected to the discharge line.

公开(公告)号：US20190006213A1

公开(公告)日：2019-01-03

申请号：US16126188

申请日：2018-09-10

Applicant: Semes Co., Ltd.

Inventor： Tae Suk YUN ,  Byung Un Kim ,  Chang Yul Cho

IPC: H01L21/67

Abstract: Provided is a substrate treatment apparatus including a housing, a supporting unit located inside the housing and supporting a substrate, a nozzle unit supplying chemicals to the substrate disposed on the supporting unit, and a chemical supplying unit supplying the chemicals to the nozzle unit. Herein, the chemical supplying unit includes a chemical supply source, a first tank and a second tank storing the chemicals, a chemical supplying line supplying the chemicals from the chemical supply source to the first tank and the second tank, a chemical discharge line supplying the chemicals from the first tank and the second tank to the nozzle unit, a circulation line allowing the chemicals to circulate through the first tank and the second tank, respectively, a member installed on the circulation line, and a controller controlling the member.