公开(公告)号：US20250140531A1

公开(公告)日：2025-05-01

申请号：US18826134

申请日：2024-09-05

Applicant: SEMES CO., LTD.

Inventor： Sang Woo KIM ,  Jae Kyung LEE ,  Ju Yong JANG

IPC: H01J37/32

Abstract: Disclosed is a substrate processing apparatus including a substrate support unit. The substrate support unit supports a substrate, has at least one pin hole formed vertically therethrough, and accommodates a lift pin therein so as to allow the lift pin to ascend and descend through the pin hole. The substrate support unit includes a ceramic puck on which the substrate is seated, a base plate configured to support the ceramic puck, an adhesive layer for coupling between the ceramic puck and the base plate, and a bush provided around the pin hole. The bush includes a first bush having a tube shape and a second bush coupled to an outer peripheral surface of the first bush, and the first bush includes a protruding portion formed on an upper surface thereof.