公开(公告)号：US11823915B2

公开(公告)日：2023-11-21

申请号：US16952629

申请日：2020-11-19

Applicant: SEMES CO., LTD.

Inventor： Jintack Yu ,  Jaemyoung Lee

IPC: H01L21/67 ,  H01L21/02 ,  B08B3/02

CPC classification number: H01L21/67051 ,  B08B3/02 ,  H01L21/02041 ,  H01L21/02057

Abstract: Provided is an apparatus for processing a substrate including a spin head on which a substrate is placed, a container provided to surround the spin head, an upper nozzle member supplying a processing solution downwards, a bottom cleaning member located to be a certain distance from the bottom of the spin head, wherein the bottom cleaning member sprays a cleaning solution to the bottom of the spin head.