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1.发明申请公开(公告)号：US20240392192A1
公开(公告)日：2024-11-28
申请号：US18670724
申请日：2024-05-21
Applicant: SEMES CO., LTD.
Inventor： Kyungseok MIN , Jinyoung KIM , Youngmoon KIM , Sooryun RO , Jisoo OH , Kwangbae KIM , Chulhee LEE
IPC: C09K13/00 , H01L21/02 , H01L21/311
Abstract: An etching gas composition includes an organic fluorine compound and tungsten fluoride.
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2.发明申请公开(公告)号：US20240392191A1
公开(公告)日：2024-11-28
申请号：US18670706
申请日：2024-05-21
Applicant: SEMES CO., LTD.
Inventor： Kyungseok MIN , Youngmoon KIM , Sooryun RO , Jisoo OH , Kwangbae KIM , Chulhee LEE
IPC: C09K13/00 , H01L21/02 , H01L21/311
Abstract: An etching gas composition includes an organic fluorine compound and carbon disulfide.
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