公开(公告)号：US20210022213A1

公开(公告)日：2021-01-21

申请号：US16932286

申请日：2020-07-17

Applicant: SEMES CO., LTD.

Inventor： Muhyeon LEE ,  Gui Su PARK ,  Byungsun BANG ,  Jungbong CHOI ,  Youngil LEE ,  Kangseop YUN ,  Seung Eun NA ,  Ye Jin CHOI ,  Kyounghwan KIM

IPC: H05B3/00 ,  H05B3/06

Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a liquid supply unit for supplying treating liquid to the substrate supported on the support unit, and a heating unit disposed in the support unit for heating the substrate supported on the support unit, wherein the heating unit includes a plurality of lamps to heat the substrate, and a window disposed above the lamps to transmit light emitted from the lamps, wherein the window includes a base in a form of a plate, and light adjustment means formed on the base to spread or converge light emitted from the lamps.