公开(公告)号：US20220028708A1

公开(公告)日：2022-01-27

申请号：US17380339

申请日：2021-07-20

Applicant: SEMES CO., LTD.

Inventor： Kangseop YUN ,  Youngil LEE ,  Jungbong CHOI

IPC: H01L21/67 ,  H01L21/687

Abstract: A support unit for supporting a substrate includes a heating member and a reflector, and the reflector includes a curved surface that reflects thermal energy generated by the heating member toward an edge region of the substrate.

公开(公告)号：US20210050235A1

公开(公告)日：2021-02-18

申请号：US16986418

申请日：2020-08-06

Applicant: SEMES CO., LTD.

Inventor： Kangseop YUN ,  Seung Hoon OH ,  Ye Jin CHOI ,  Youngil LEE ,  Byungsun BANG ,  Jungbong CHOI ,  Gui Su PARK

IPC: H01L21/67 ,  H01L21/687

Abstract: The inventive concept provides a support unit for supporting a substrate. The support unit includes a support plate that has an interior space and on which the substrate is placed, a heating member that is provided in the interior space and that heats the substrate placed on the support plate, a heat insulating plate provided in the interior space and disposed under the heating member, a reflective plate provided in the interior space and disposed under the heat insulating plate, and a heat dissipation plate provided in the interior space and disposed under the a reflective plate.

公开(公告)号：US20210022213A1

公开(公告)日：2021-01-21

申请号：US16932286

申请日：2020-07-17

Applicant: SEMES CO., LTD.

Inventor： Muhyeon LEE ,  Gui Su PARK ,  Byungsun BANG ,  Jungbong CHOI ,  Youngil LEE ,  Kangseop YUN ,  Seung Eun NA ,  Ye Jin CHOI ,  Kyounghwan KIM

IPC: H05B3/00 ,  H05B3/06

Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a liquid supply unit for supplying treating liquid to the substrate supported on the support unit, and a heating unit disposed in the support unit for heating the substrate supported on the support unit, wherein the heating unit includes a plurality of lamps to heat the substrate, and a window disposed above the lamps to transmit light emitted from the lamps, wherein the window includes a base in a form of a plate, and light adjustment means formed on the base to spread or converge light emitted from the lamps.

公开(公告)号：US20210013047A1

公开(公告)日：2021-01-14

申请号：US17030514

申请日：2020-09-24

Applicant: SEMES CO., LTD.

Inventor： Youngil LEE ,  Jungbong CHOI ,  Seungho LEE ,  Gui Su PARK ,  Gil Hun SONG ,  Seung Hoon OH ,  Jonghan KIM

IPC: H01L21/311 ,  H01L21/67 ,  H01L21/02 ,  H01L21/306 ,  H01L21/687

Abstract: A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus includes a support member to support a substrate, a treatment liquid nozzle to supply a treatment liquid to the substrate positioned on the support member, and a controller to control the treatment liquid nozzle such that the treatment liquid supplied to the substrate is differently discharged in a low-flow-supply section and a high-flow-supply section in which an average discharge amount per hour is more than an average discharge amount per hour in the low-flow-supply section.

公开(公告)号：US20190115224A1

公开(公告)日：2019-04-18

申请号：US16158728

申请日：2018-10-12

Applicant: SEMES CO., LTD.

Inventor： Youngil LEE ,  Jungbong CHOI ,  Seungho LEE ,  Gui Su PARK ,  Gil Hun SONG ,  Seung Hoon OH ,  Jonghan KIM

IPC: H01L21/311 ,  H01L21/306 ,  H01L21/02 ,  H01L21/67

Abstract: A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus includes a support member to support a substrate, a treatment liquid nozzle to supply a treatment liquid to the substrate positioned on the support member, and a controller to control the treatment liquid nozzle such that the treatment liquid supplied to the substrate is differently discharged in a low-flow-supply section and a high-flow-supply section in which an average discharge amount per hour is more than an average discharge amount per hour in the low-flow-supply section.